Electrothermal simulation

  • 文章类型: Journal Article
    开发了一种基于生物可吸收Mg-Nd-Zn-Zr合金的可植入电极,用于下一代射频(RF)组织焊接应用,旨在减少热损伤,提高吻合口强度。镁合金焊条在焊接区域设计了圆柱面(CS)和连续长环(LR)不同的结构特征,并通过有限元分析(FEA)对电热模拟进行了研究。同时,监测组织焊接过程中的温度变化,并通过测量撕脱力和爆裂压力评估焊接组织的吻合强度。FEA结果表明,当将110V的交流电施加到LR电极10s时,焊接区域的平均温度和坏死组织的比例显着降低。在离体组织焊接实验中,LR电极焊接组织的最高温度和平均温度也明显降低,焊接组织的吻合强度明显提高。总的来说,应用LR电极后可获得满足临床要求的理想焊接温度和吻合强度,表明,优化结构设计的Mg-Nd-Zn-Zr合金显示出开发用于下一代射频组织焊接应用的植入式电极的巨大潜力。
    An implantable electrode based on bioresorbable Mg-Nd-Zn-Zr alloy was developed for next-generation radiofrequency (RF) tissue welding application, aiming to reduce thermal damage and enhance anastomotic strength. The Mg alloy electrode was designed with different structural features of cylindrical surface (CS) and continuous long ring (LR) in the welding area, and the electrothermal simulations were studied by finite element analysis (FEA). Meanwhile, the temperature variation during tissue welding was monitored and the anastomotic strength of welded tissue was assessed by measuring the avulsion force and burst pressure. FEA results showed that the mean temperature in the welding area and the proportion of necrotic tissue were significantly reduced when applying an alternating current of 110 V for 10 s to the LR electrode. In the experiment of tissue welding ex vivo, the maximum and mean temperatures of tissues welded by the LR electrode were also significantly reduced and the anastomotic strength of welded tissue could be obviously improved. Overall, an ideal welding temperature and anastomotic strength which meet the clinical requirement can be obtained after applying the LR electrode, suggesting that Mg-Nd-Zn-Zr alloy with optimal structure design shows great potential to develop implantable electrode for next-generation RF tissue welding application.
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  • 文章类型: Journal Article
    为了提高爆炸箔引发剂系统(EFI)的能量效率,并减轻桥翼区域烧蚀造成的能量损失,设计并制作了低能耗桥翼加厚电喷芯片。计算分析表明,在电爆炸期间,增加桥侧面的厚度可显着减少桥区域内的烧蚀。设计的改进导致采用了19μm的桥侧面厚度,桥面尺寸规定为0.25mm×0.25mm×4μm。这种桥接翼加厚的EFI芯片是通过采用微机电系统(MEMS)技术生产的,并经过了严格的性能评估。实证结果与计算预测非常吻合,从而证实了所提出的模型在模拟爆炸过程中看到的温度分布的精度。值得注意的是,这种增强的EFI设计在900V/0.22μF的条件下实现了3800m/s的飞片速度,标志着EFI系统效率和性能的显著进步。
    To enhance the energy efficiency of exploding foil initiator systems (EFIs) and mitigate energy loss due to ablation in the bridge-wing regions, a low-energy bridge-wing-thickened EFI chip was designed and fabricated. Computational analysis revealed that increasing the thickness of the bridge flanks significantly reduces ablation within the bridge region during the electrical explosion. The refinement of the design led to the adoption of a bridge flank thickness of 19 μm, with the bridge area dimensions specified as 0.25 mm × 0.25 mm × 4 μm. This bridge-wing-thickened EFI chip was produced by employing micro-electro-mechanical systems (MEMS) technology and underwent rigorous performance evaluations. The empirical results closely matched the computational predictions, thereby corroborating the precision of the proposed model in simulating the temperature distribution seen during the explosion process. Notably, this enhanced EFI design achieves a flyer velocity of 3800 m/s at a condition of 900 V/0.22 μF, signifying a significant advancement in EFI system efficiency and performance.
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  • 文章类型: Journal Article
    通过电热模拟研究了具有双金属栅极(DMG)结构的AlGaN/GaN高电子迁移率晶体管(HEMT)器件的电学和热学特性,并与常规单金属栅极(SMG)结构的器件进行了比较。模拟表明,当考虑自热效应时,DMG结构器件的跨导比SMG结构器件高10%。同时,采用DMG结构,在6W/mm的功率密度下,器件的最大温升可以降低11%以上。此外,使用该结构,在器件的栅极边缘处的热产生分布的峰值被减小。这些结果可以归因于栅极区电场分布的变化和自热效应的抑制。因此,采用DMG结构改善了AlGaN/GaNHEMT器件的电性能和热性能。
    The electrical and thermal characteristics of AlGaN/GaN high-electron mobility transistor (HEMT) devices with a dual-metal gate (DMG) structure are investigated by electrothermal simulation and compared with those of conventional single-metal gate (SMG) structure devices. The simulations reveal that the DMG structure devices have a 10-percent higher transconductance than the SMG structure devices when the self-heating effect is considered. In the meantime, employing the DMG structure, a decrease of more than 11% in the maximum temperature rise of the devices can be achieved at the power density of 6 W/mm. Furthermore, the peak in heat generation distribution at the gate edge of the devices is reduced using this structure. These results could be attributed to the change in the electric field distribution at the gate region and the suppression of the self-heating effect. Therefore, the electrical and thermal performances of AlGaN/GaN HEMT devices are improved by adopting the DMG structure.
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