■下颌骨的节段性身体缺陷导致受影响区域的完全丧失。在我们之前的研究中,我们在一项动物研究中调查了带有减压装置(PRD)的定制下颌骨假体(CMP)的临床适用性。在这项研究中,我们进一步将牙科植入物纳入CMP,并探索了牙科植入物PRD(iPRD)设计的使用。
■通过采用有限元分析方法,我们创建了4种类型的CMP:CMP,CMP与iPRD,CMP-PRD,和CMP-PRD与iPRD。我们为iPRD开发了2个参数:上部的锥体长度(CL)和下部的弹簧间距(SP)。使用响应面方法(RSM),我们为iPRD确定了最合适的结构分配。
■我们的结果表明,CMP-PRD在整个组件中具有最高的vonMises应力值(1076.26MPa)。对于固定螺钉和支座,带有iPRD的CMP具有最高的vonMises应力值(319.97和452.78MPa,分别)。CMP-PRD在前下颌骨中具有最高的主应力(131.66MPa)。iPRD降低了前下颌骨和后下颌骨的主应力。使用RSM,我们产生了25个组进行比较,以获得iPRD最有利的结果,在进一步的临床试验中,我们可能建议CL为12mm,SP为0.4mm.
■在CMP中使用PRD和iPRD可以解决与CMP相关的挑战,从而促进其在临床实践中的使用。
UNASSIGNED: Segmental body defects of the mandible result in the complete loss of the affected region. In our previous
study, we investigated the clinical applicability of a customized mandible prosthesis (CMP) with a pressure-reducing device (PRD) in an animal
study. In this
study, we further incorporated dental implants into the CMP and explored the use of dental implant PRD (iPRD) designs.
UNASSIGNED: By employing a finite element analysis approach, we created 4 types of CMP: CMP, CMP with iPRD, CMP-PRD, and CMP-PRD with iPRD. We developed 2 parameters for the iPRD: cone length (CL) in the upper part and spring pitch (SP) in the lower part. Using the response surface methodology (RSM), we determined the most suitable structural assignment for the iPRD.
UNASSIGNED: Our results indicate that CMP-PRD had the highest von Mises stress value for the entire assembly (1076.26 MPa). For retentive screws and abutments, CMP with iPRD had the highest von Mises stress value (319.97 and 452.78 MPa, respectively). CMP-PRD had the highest principal stress (131.66 MPa) in the anterior mandible. The iPRD reduced principal stress in both the anterior and posterior mandible. Using the RSM, we generated 25 groups for comparison to achieve the most favorable results for the iPRD and we might suggest the CL to 12 mm and the SP to 0.4 mm in the further clinical trials.
UNASSIGNED: Use of the PRD and iPRD in CMP may resolve the challenges associated with CMP, thereby promoting its usage in clinical practice.