关键词: Active species Emerging contaminants Far-UVC Oxidation PAA Water treatment

Mesh : Photolysis Water Pollutants, Chemical / chemistry Ultraviolet Rays Peracetic Acid / chemistry Water Purification / methods Carbamazepine / chemistry Oxidation-Reduction

来  源:   DOI:10.1016/j.watres.2024.121943

Abstract:
Krypton chloride (KrCl*) excimer lamps (222 nm) are used as a promising irradiation source to drive ultraviolet-based advanced oxidation processes (UV-AOPs) in water treatment. In this study, the UV222/peracetic acid (PAA) process is implemented as a novel UV-AOPs for the degradation of emerging contaminants (ECs) in water. The results demonstrate that UV222/PAA process exhibits excellent degradation performance for carbamazepine (CBZ), with a removal rate of 90.8 % within 45 min. Notably, the degradation of CBZ in the UV222/PAA process (90.8 %) was significantly higher than that in the UV254/PAA process (15.1 %) at the same UV dose. The UV222/PAA process exhibits superior electrical energy per order (EE/O) performance while reducing resource consumption associated with the high-energy UV254/PAA process. Quenching experiments and electron paramagnetic resonance (EPR) detection confirm that HO• play a dominant role in the reaction. The contributions of direct photolysis, HO•, and other active species (RO• and 1O2) are estimated to be 5 %, 88 %, and 7 %, respectively. In addition, the effects of Cl-, HCO3-, and humic acid (HA) on the degradation of CBZ are evaluated. The presence of relatively low concentrations of Cl-, HCO3-, and HA can inhibit CBZ degradation. The UV222/PAA oxidation process could also effectively degrade several other ECs (i.e., iohexol, sulfamethoxazole, acetochlor, ibuprofen), indicating the potential application of this process in pollutant removal. These findings will propel the development of the UV222/PAA process and provide valuable insights for its application in water treatment.
摘要:
氯化氪(KrCl*)准分子灯(222nm)被用作有前途的辐射源,可在水处理中驱动基于紫外线的高级氧化工艺(UV-AOP)。在这项研究中,UV222/过乙酸(PAA)工艺是一种新型的UV-AOPs,用于降解水中的新兴污染物(EC)。结果表明,UV222/PAA工艺对卡马西平(CBZ)具有优异的降解性能,45min内去除率达90.8%。值得注意的是,在相同UV剂量下,UV222/PAA工艺中CBZ的降解(90.8%)显著高于UV254/PAA工艺中CBZ的降解(15.1%)。UV222/PAA工艺表现出优异的每订单电能(EE/O)性能,同时减少与高能UV254/PAA工艺相关的资源消耗。淬火实验和电子顺磁共振(EPR)检测证实,HO•在反应中起主导作用。直接光解的贡献,HO•,和其他活性物种(RO和1O2)估计为5%,88%,7%,分别。此外,Cl-的影响,HCO3-,和腐殖酸(HA)对CBZ的降解停止了评价。相对低浓度的Cl-的存在,HCO3-,和HA可以抑制CBZ降解。UV222/PAA氧化过程还可以有效降解其他几种EC(即,碘海醇,磺胺甲恶唑,乙草胺,布洛芬),表明该工艺在污染物去除中的潜在应用。这些发现将推动UV222/PAA工艺的发展,并为其在水处理中的应用提供有价值的见解。
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