Abstract：
2D thin films, possessing atomically thin thickness, are emerging as promising candidates for next-generation electronic devices, due to their novel properties and high performance. In the early years, a wide variety of 2D materials are prepared using several methods (mechanical/liquid exfoliation, chemical vapor deposition, etc.). However, the limited size of 2D flakes hinders their fundamental research and device applications, and hence the effective large-scale preparation of 2D films is still challenging. Recently, pulsed laser deposition (PLD) has appeared to be an impactful method for wafer-scale growth of 2D films, owing to target-maintained stoichiometry, high growth rate, and efficiency. In this review, the recent advances on the PLD preparation of 2D films are summarized, including the growth mechanisms, strategies, and materials classification. First, efficacious strategies of PLD growth are highlighted. Then, the growth, characterization, and device applications of various 2D films are presented, such as graphene, h-BN, MoS2 , BP, oxide, perovskite, semi-metal, etc. Finally, the potential challenges and further research directions of PLD technique is envisioned.
摘要：
2D薄膜，具有原子薄的厚度，正在成为下一代电子设备的有希望的候选人，由于其新颖的性能和高性能。早年,使用几种方法(机械/液体剥离，化学气相沉积,等。).然而,二维薄片的有限尺寸阻碍了它们的基础研究和设备应用，因此，有效的大规模制备2D薄膜仍然具有挑战性。最近,脉冲激光沉积（PLD）似乎是一种有效的二维薄膜晶圆级生长方法，由于目标保持的化学计量，高增长率,和效率。在这次审查中,综述了近年来二维薄膜PLD制备的研究进展,包括增长机制，战略,和材料分类。首先,重点介绍了PLD生长的有效策略。然后，增长,表征，介绍了各种2D薄膜的器件应用，比如石墨烯，h-BN,MoS2,BP,氧化物,钙钛矿,半金属,等。最后,展望了PLD技术的潜在挑战和进一步的研究方向。
