超表面由周期性亚波长纳米结构组成,并表现出自然界中没有发现的光学特性。它们已被广泛用于光学应用,如全息图,波前整形,和结构彩色印刷,然而,电子束光刻法由于高制造成本和低生产率而不适于产生大面积的超表面。虽然替代光学技术,如全息光刻和等离子体光刻,可以克服这些缺点,这种方法仍然受到光学衍射极限的限制。要突破这个根本问题,机械纳米图案化工艺已经在许多领域得到了积极的研究,纳米压印光刻(NIL)走在前列。由于NIL复制模具的纳米图案,而不考虑衍射极限,NIL可以实现足够高的生产率和图案化分辨率,导致超表面制造的爆炸性发展。在这次审查中,我们专注于制造超表面的各种NIL技术。首先,我们简要描述了传统的NIL,然后提出了各种NIL方法,用于可扩展地制造超表面。我们还讨论了NIL在元表面实现中的最新应用。最后,最后,我们对每种方法进行了展望,并提出了对活性超表面的高通量制造的未来研究的观点。
Metasurfaces are composed of periodic sub-wavelength nanostructures and exhibit optical properties that are not found in nature. They have been widely investigated for optical applications such as holograms, wavefront shaping, and structural color printing, however, electron-beam lithography is not suitable to produce large-area metasurfaces because of the high fabrication cost and low productivity. Although alternative optical technologies, such as holographic lithography and plasmonic lithography, can overcome these drawbacks, such methods are still constrained by the optical diffraction limit. To break through this fundamental problem, mechanical nanopatterning processes have been actively studied in many fields, with nanoimprint lithography (NIL) coming to the forefront. Since NIL replicates the nanopattern of the mold regardless of the diffraction limit, NIL can achieve sufficiently high productivity and patterning resolution, giving rise to an explosive development in the fabrication of metasurfaces. In this review, we focus on various NIL technologies for the manufacturing of metasurfaces. First, we briefly describe conventional NIL and then present various NIL methods for the scalable fabrication of metasurfaces. We also discuss recent applications of NIL in the realization of metasurfaces. Finally, we conclude with an outlook on each method and suggest perspectives for future research on the high-throughput fabrication of active metasurfaces.