前言:目的:钛种植体以其生物相容性和力学性能在手术中得到广泛应用。然而,过量的钛颗粒释放会导致植入物失败。这项研究探索了原子层沉积(ALD),以涂覆商业纯钛(Cp-Ti)与TiO2,旨在提高其摩擦和耐腐蚀性,同时减少颗粒释放。通过比较不同ALD循环数的TiO2薄膜,我们评估表面性质,粒子释放,摩擦,和腐蚀性能,提供对减轻植入物颗粒释放的见解。方法:制备Cp-Ti表面并涂覆100、300和500个ALD循环的TiO2膜。表面表征涉及SEM,EDX,和XRD。使用SEM测试摩擦,纳米压痕,和ICP-MS通过浸渍试验和电化学分析评价耐腐蚀性。使用BMSC评估细胞毒性。结果:表面表征显示,ALD周期增加的表面更光滑,确认成功的TiO2沉积。摩擦测试表明,随着ALD循环次数的增加,摩擦系数降低。由纳米压痕结果支持。随着ALD周期的增加,耐腐蚀性得到改善,由电化学测试和减少钛释放证明。细胞毒性研究显示没有显著的细胞毒性作用。结论:ALD涂覆的TiO2薄膜显着增强了钛植入物的摩擦和耐腐蚀性,同时减少了颗粒释放。这项研究强调了ALD周期数在优化薄膜性能方面的重要性,为设计具有改进性能的植入物提供见解。
Objective: Titanium implants are widely used in surgeries for their biocompatibility and mechanical properties. However, excessive titanium particle release can cause implant failure. This study explores Atomic Layer Deposition (ALD) to coat commercially pure titanium (Cp-Ti) with TiO2, aiming to improve its frictional and corrosion resistance while reducing particle release. By comparing TiO2 films with varying ALD cycle numbers, we assess surface properties, particle release, friction, and corrosion performance, providing insights into mitigating particle release from implants. Methods: Cp-Ti surfaces were prepared and coated with TiO2 films of 100, 300, and 500 ALD cycles. Surface characterization involved SEM, EDX, and XRD. Friction was tested using SEM, nanoindentation, and ICP-MS. Corrosion resistance was evaluated through immersion tests and electrochemical analysis. Cytotoxicity was assessed using BMSCs. Results: Surface characterization revealed smoother surfaces with increased ALD cycles, confirming successful TiO2 deposition. Friction testing showed reduced friction coefficients with higher ALD cycles, supported by nanoindentation results. Corrosion resistance improved with increasing ALD cycles, as evidenced by electrochemical tests and reduced titanium release. Cytotoxicity studies showed no significant cytotoxic effects. Conclusion: ALD-coated TiO2 films significantly enhance frictional and corrosion resistance of titanium implants while reducing particle release. The study underscores the importance of ALD cycle numbers in optimizing film performance, offering insights for designing implants with improved properties.