在当前的研究中,已使用化学沉淀法有效合成了各种浓度(0.01-0.04M)的NiO和Cu离子掺杂的NiO纳米颗粒。以下技术用于表征材料的结构,形态学,元素分析,功能组,光学和磁性能:XRD,TEM,HR-TEM,SAED,SEM,EDX,FTIR,UV,PL和VSM。根据这个Scherrer公式,测定纯NiO和Cu掺杂NiO材料的平均晶体尺寸为16.37nm,15.21nm,14.88nm,18.35nm,和10.88纳米,分别。HR-TEM图像显示,d间距值约为0.24nm,与纯的和铜掺杂的NiO纳米粒子的立方NiO的(111)平面重合。Cu掺杂NiO纳米材料的SEM显微照片显示出微小的团聚颗粒,而纯NiO纳米粒子显示球形结构。纯NiO和Cu掺杂的NiO纳米粒子的带隙值为2.32eV,2.29eV,2.24eV,2.22eV,和2.27eV,分别。不同浓度的Cu掺杂NiO纳米粒子(0.01-0.03M)可以显着降低带隙,而不会显着改变结构,使它们成为制造光电器件的潜在材料。铜被掺入到NiO纳米粒子中,这对磁性能产生了重大影响,并将材料从弱铁磁变为铁磁。与未掺杂的NiO纳米粒子相比,0.01M和0.03M的Cu掺杂纳米颗粒的饱和磁化强度和矫顽力值要高得多。该结果表明,这种Cu掺杂的NiO纳米颗粒具有有希望的磁性应用。
NiO and Cu-ion doped NiO nanoparticles with various concentrations (0.01-0.04 M) have been effectively synthesized in the current investigation using chemical precipitation method. The following techniques were used to characterized the materials\' structural, morphological, elemental analysis, functional group, optical and magnetic properties: XRD, TEM, HR-TEM, SAED, SEM, EDX, FTIR, UV, PL and VSM. According to this Scherrer formula, the average crystalline sizes of the materials of pure NiO and Cu-doped NiO were determined to be 16.37 nm, 15.21 nm, 14.88 nm, 18.35 nm, and 10.88 nm, respectively. The HR-TEM images revealed that the d-spacing values about 0.24 nm, which coincides with the (111) plane of cubic NiO for pure and copper doped NiO nanoparticles. The SEM micrographs of Cu-doped NiO nanomaterials shows tiny agglomerated particles, while that of pure NiO nanoparticles shows spherical structure. Pure NiO and Cu-doped NiO nanoparticles have band gap values of 2.32 eV, 2.29 eV, 2.24 eV, 2.22 eV, and 2.27 eV, respectively. The Cu-doped NiO nanoparticles (0.01-0.03 M) at various concentrations can significantly reduce the band gap without significantly altering the structure, making them a potential material for creating optoelectronic devices. Copper was incorporated into NiO nanoparticles, which had a significant impact on the magnetic properties and changed the material from weakly ferromagnetic to ferromagnetic. In comparison to undoped NiO nanoparticles, the saturation magnetization and coercivity values of the 0.01 M and 0.03 M of Cu-doped nanoparticles is much higher. This outcome demonstrates that such Cu-doped NiO nanoparticles have promising magnetic applications.