Nanoimprinting large-area structures, especially high-density features like meta lenses, poses challenges in achieving defect-free nanopatterns. Conventional high-resolution molds for nanoimprinting are often expensive, typically constructed from inorganic materials such as silicon, nickel (Ni), or quartz. Unfortunately, replicated nanostructures frequently suffer from breakage or a lack of definition during demolding due to the high adhesion and friction at the polymer-mold interface. Moreover, mold degradation after a limited number of imprinting cycles, attributed to contamination and damaged features, is a common issue. In this study, a disruptive approach is presented to address these challenges by successfully developing an anti-sticking nanocomposite mold. This nanocomposite mold is created through the co-deposition of nickel atoms and low surface tension polytetrafluoroethylene (PTFE) nanoparticles via electroforming. The incorporation of PTFE enhances the ease of polymer release from the mold. The resulting Ni-PTFE nanocomposite mold exhibits exceptional lubrication properties and a significantly reduced surface energy. This robust nanocomposite mold proves effective in imprinting fine, densely packed nanostructures down to 100 nm using thermal nanoimprinting for at least 20 cycles. Additionally, UV nanoimprint lithography (UV-NIL) is successfully performed with this nanocomposite mold. This work introduces a novel and cost-effective approach to reusable high-resolution molds, ensuring defect-reduction production in nanoimprinting.

Polarized light detection can effectively identify the difference between the polarization information on the target and the background, which is of great significance for detection in complex natural environments and/or extreme weather. Generally, polarized light detection inevitably relies on anisotropic structures of photodetector devices, while organic-inorganic hybrid perovskites are ideal for anisotropic patterning due to their simple and efficient preparation by solution method. Compared to patterned thin films, patterned arrays of aligned one-dimensional (1D) perovskite nanowires (PNWAs) have fewer grain boundaries and lower defect densities, making them well suited for high-performance polarization-sensitive photodetectors. Here, we fabricated PNWAs crystallographically aligned with variable line widths and alignment densities employing CD-ROM and DVD-ROM grating pattern template-confined growth (TCG) methods. The photodetectors constructed from MAPbI3 PNWAs achieved responsivity of 35.01 A/W, detectivity of 6.85 × 1013 Jones, and fast response with a rise time of 172 μs and fall time of 114 μs. They were successfully applied to high-performance polarization detection with a polarization ratio of 1.81, potentially applicable in polarized light detection systems.

Surface plasmon resonance is an effect widely used for biosensing. Biosensors based on this effect operate in different configurations, including the use of diffraction gratings as couplers. Gratings are highly tunable and are easy to integrate into a fluidic system due to their planar configuration. We discuss the optimization of plasmonic grating couplers for use in a specific sensor configuration based on the optical switch. These gratings present a sinusoidal profile with a high depth/period ratio. Their interaction with a p-polarized light beam results in two significant diffracted orders (the 0th and the -1st), which enable differential measurements cancelling noise due to common fluctuations. The gratings are fabricated by combining laser interference lithography with nanoimprinting in a process that is aligned with the challenges of low-cost mass production. The effects of different grating parameters such as the period, depth and profile are theoretically and experimentally investigated.

Despite the remarkable advances made in the development of 2D perovskites suitable for various high-performance devices, the development of sub-30 nm nanopatterns of 2D perovskites with anisotropic photoelectronic properties remains challenging. Herein, a simple but robust route for fabricating sub-30 nm 1D nanopatterns of 2D perovskites over a large area is presented. This method is based on nanoimprinting a thin precursor film of a 2D perovskite with a topographically pre-patterned hard poly(dimethylsiloxane) mold replicated from a block copolymer nanopattern consisting of guided self-assembled monolayered in-plane cylinders. 1D nanopatterns of various 2D perovskites (A\'2 MAn -1 Pbn X3 n +1 ,A\' = BA, PEA, X = Br, I) are developed; their enhanced photoluminescence (PL) quantum yields are approximately four times greater than those of the corresponding control flat films. Anisotropic photocurrent is observed because 2D perovskite nanocrystals are embedded in a topological 1D nanopattern. Furthermore, this 1D metal-coated nanopattern of a 2D perovskite is employed as a color conversion optical polarizer, in which polarized PL is developed. This is due to its capability of polarization of an incident light arising from the sub-30 nm line pattern, as well as the PL of the confined 2D perovskite nanocrystals in the pattern.

The versatile hybrid perovskite nanocrystals (NCs) are one of the most promising materials for optoelectronics by virtue of their tunable bandgaps and high photoluminescence (PL) quantum yields. However, their inherent crystalline chemical structure limits the chiroptical properties achievable with the material. The production of chiral perovskites has become an active field of research for its promising applications in optics, chemistry, or biology. Typically, chiral halide perovskites are obtained by the incorporation of different chiral moieties in the material. Unfortunately, these chemically modified perovskites have demonstrated moderate values of chiral PL so far. Here, a general and scalable approach is introduced to produce chiral PL from arbitrary nanoemitters assembled into 2D-chiral metasurfaces. The fabrication via nanoimprinting lithography employs elastomeric molds engraved with chiral motifs covering millimeter areas that are used to pattern two types of unmodified colloidal perovskite NC inks: green-emissive CsPbBr3 and red-emissive CsPbBr1 I2 . The perovskite 2D-metasurfaces exhibit remarkable PL dissymmetry factors (glum ) of 0.16 that can be further improved up to glum of 0.3 by adding a high-refractive-index coating on the metasurfaces. This scalable approach to produce chiral photoluminescent thin films paves the way for the seamless production of bright chiral light sources for upcoming optoelectronic applications.

Nanolenses are gaining importance in nanotechnology, but their challenging fabrication is thwarting their wider adoption. Of particular challenge is facile control of the lens\' curvature. In this work, we demonstrate a new nanoimprinting technique capable of realizing polymeric nanolenses in which the nanolens\' curvature is optically controlled by the ultraviolet (UV) dose at the pre-curing step. Our results reveal a regime in which the nanolens\' height changes linearly with the UV dose. Computational modeling further uncovers that the polymer undergoes highly nonlinear dynamics during the UV-controlled nanoimprinting process. Both the technique and the process model will greatly advance nanoscale science and manufacturing technology.

Trigger-responsive surfaces with multiple surface properties have wide-ranging application potential from surfaces with trigger-responsive fluid flow to cell culture to optical effects; such surfaces can be achieved through surface morphological changes. Although multiple shape-memory effects are successful in bulk polymers, there is limited programing and recovery of multiple surface memories due to the challenges in fabricating multiple surface topographies with good controllability. Here, we report the synergy between the polymer blend formulation and the thermal nanoimprinting process to achieve multiple microtopography memories. A series of immiscible blends consisting of poly(caprolactone) (PCL) and polyethylene (PE) with distinct thermal transitions governed by distinct crystallization events were augmented with improved elasticity through preferential cross-linking in the polymer blend. The effect of preferential cross-linking by dicumyl peroxide on the elastic property of the PCL/PE has been found to be nonlinearly dependent on the blend composition. This approach enabled triple and quadruple surface pattern fixity and recovery in nanoimprinted PCL/PE blends. Specifically, we demonstrated the recovery of a micropillar structure (diameter: 20 μm and height: 10 μm) from a hierarchical micrograting topography (width: 2 μm and height: 2 μm) when exposed to a thermal stimulus at 60 °C for 180 s. Furthermore, we also demonstrated the recovery of a deformed micrograting followed by a secondary recovery of the micropillar structure.

We present the fabrication of three-dimensional inlets with gradually decreasing widths and depths and with nanopillars on the slope, all defined in just one lithography step. In addition, as an application, we show how these micro- and nanostructures can be used for micro- and nanofluidics and lab-on-a-chip devices to facilitate the flow and analyze single molecules of DNA. For the fabrication of 3D inlets in a single layer process, dose-modulated electron beam lithography was used, producing depths between 750 nm and 50 nm along a 30 μm long inlet, which is additionally structured with nanometer-scale pillars randomly distributed on top, as a result of incomplete exposure and underdevelopment of the resist. The fabrication conditions affect the slope of the inlet, the nanopillar density and coverage. The key parameters are the dose used for the electron beam exposure and the development conditions, like the developer\'s dilution, stirring and development time. The 3D inlets with nanostructured pillars were integrated into fluidic devices, acting as a transition between micro and nanofluidic structures for pre-stretching and unfolding DNA molecules, avoiding the intrusion of folded molecules and clogging the analysis channel. After patterning these structures in silicon, they can be replicated in polymer by UV nanoimprinting. We show here how the inlets with pillars slow down the molecules before they enter the nanochannels, resulting in a 3-fold decrease in speed, which would translate to an improvement in the resolution for DNA optical mapping.

Roll-to-plate nanoimprinting with flexible stamps is a fabrication method to pattern large-area substrates with micro- and nanotextures. The imprint consists of the preferred texture on top of a residual layer, of which the thickness and uniformity is critical for many applications. In this work, a numerical model is developed to predict the residual layer thickness (RLT) as a function of the imprint parameters. The model is based on elastohydrodynamic lubrication (EHL) theory, which combines lubrication theory for the pressure build-up in the resin film, with linear elasticity theory for the elastic deformation of the roller material. The model is extended with inextensible cylindrical shell theory to capture the effect of the flexible stamp, which is treated as a tensioned web. The results show that an increase in the tension of the web increases the effective stiffness of the roller, resulting in a reduction in the RLT. The numerical results are validated with layer height measurements from flat layer imprints. It is shown that the simulated minimum layer height corresponds very well with the experimental results for a wide range of resin viscosities, imprint velocities, and imprint loads.

In the last decade, a new technique has been developed for the nanoimprinting of thin-metal foils using laser-induced shock waves. Recent studies have proposed replacing metal or silicone molds with inexpensive polymer molds for nanoimprinting. In addition, explosive-derived shock waves provide deeper imprinting than molds, greatly simplifying the application of this technology for mass production. In this study, we focused on explosive-derived shock waves, which persist longer than laser-induced shock waves. A numerical analysis and a set of simplified molding experiments were conducted to identify the cause of the deep imprint. Our numerical analysis has accurately simulated the pressure history and deformation behavior of the workpiece and the mold. Whereas a high pressure immediately deforms the polymer mold, a sustained pressure gradually increases the molding depth of the workpiece. Therefore, the duration of the pressure can be one of the conditions to control the impact imprint phenomenon.