electrical breakdown

  • 文章类型: Journal Article
    最近,据报道,植入式心脏复律除颤器中的极性依赖性电击失败是由高压馈通的结构故障引起的。当右心室线圈在双相电击(阴极电击)的1阶段处于阴极状态时,可能会发生短路。这种观点提出了一种观察到的极性依赖性的机制,并考虑了相同的机制是否可能适用于其他冲击引起的,短路。植入式心律转复除颤器与导线的连接穿过馈通进入密封外壳(“Can”)。馈通包括2个同心,导电金属圆筒,右心室线圈和外部Can的内部引脚导体,由不透水的绝缘隔开。冲击失效取决于3个条件:1)馈通中流体层的发展,创建与冲击路径平行的传导路径;2)流体中电场的径向梯度,因此,冲击过程中的电阻加热使水蒸发,在引脚周围形成高电阻气泡;3)阴极处电子的场发射,速率和能量取决于场的强度和阴极的势能势垒发射。对于阴极冲击,在金属引脚处发射的电子可能会在气体中引发电离雪崩,直到它“分解”为低电阻等离子体,导致短路。对于阳极电击,有效的阴极是液-气界面,其中磁场比引脚处弱。此外,水溶液中的溶剂化电子必须克服更高的势能势垒才能发射。这允许高阻力气泡稳定,从而完成冲击。
    Recently, polarity-dependent shock failures were reported in implantable cardioverter-defibrillators caused by structural failure in the high-voltage feedthrough. Short circuits may occur when the right ventricular coil is cathodal for phase 1 of biphasic shocks (cathodal shock). This viewpoint proposes a mechanism for observed polarity dependence and considers whether the same mechanism may apply in other shock-induced, short circuits. Implantable cardioverter-defibrillator connections to the lead traverse feedthroughs into the hermetically sealed housing (\"Can\"). The feedthrough comprises 2 concentric, conducting metal cylinders, the inner pin-conductor to the right ventricular coil and outer Can, separated by impermeable insulation. Shock failure depends on 3 conditions: 1) development of a fluid layer in the feedthrough, creating a conduction path in parallel with the shock pathway; 2) the radial gradient of the electric field in the fluid, so resistive heating during a shock vaporizes water to form a high-resistance gas bubble around the pin; and 3) field emission of electrons at the cathode, with rate and energy dependent on the field\'s strength and the cathode\'s potential-energy barrier to emission. For cathodal shocks, electrons emitted at the metal pin may initiate an ionization avalanche in the gas until it \"breaks down\" into a low-resistance plasma, resulting in a short circuit. For anodal shocks, the effective cathode is the liquid-gas interface, where the field is weaker than at the pin. Additionally, solvated electrons in aqueous solution must overcome a higher potential-energy barrier to be emitted. This permits the high-resistance gas bubble to stabilize so that the shock is completed.
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  • 文章类型: Journal Article
    电击穿是电力设备和电子设备中的重要物理现象。最近,AC和DC击穿的机理已初步揭示为电极-电介质界面击穿和体击穿,分别,基于空间电荷动力学,通过数值计算。然而,交流击穿机制仍然缺乏足够的直接实验支持,这限制了对电气结构的进一步理解和设计开发。这里,在这项研究中,将具有33μm至230μm的各种厚度的LDPE薄膜用臭氧表面改性不同的持续时间,以实验研究DC和AC击穿机理。结果表明,羰基(C=O)被引入到薄膜表面,形成浅表面陷阱,导致平均陷阱深度降低,陷阱密度增加。这种表面氧化调制的陷阱分布导致增强的空间电荷注入和体电场畸变,随着氧化持续时间的延长,DC击穿强度降低,在所有薄膜厚度。然而,这种击穿强度的降低仅发生在交流应力下低于55μm的薄膜中,由于在电极-电介质界面处增强的电场畸变更加明显,并且在薄膜中占主导地位。这些实验结果进一步证实了所提出的电介质膜的电极-电介质界面击穿,并提供了对空间电荷调制电击穿的新认识,这符合介电击穿理论,有利于电力设备和电子设备的小型化。
    Electrical breakdown is an important physical phenomenon in power equipment and electronic devices. Recently, the mechanism of AC and DC breakdown has been preliminarily revealed as electrode-dielectric interface breakdown and bulk breakdown, respectively, based on space charge dynamics through numerical calculations. However, the AC breakdown mechanism still lacks enough direct experimental support, which restricts further understanding and the design and development of electrical structures. Here, in this study, LDPE films with various thicknesses ranging from 33 μm to 230 μm were surface modified with ozone for different durations to experimentally investigate DC and AC breakdown mechanism. The results indicate that carbonyl groups (C=O) were introduced onto the film surface, forming shallow surface traps and leading to a decreased average trap depth and an increased trap density. Such a surface oxidation modulated trap distribution led to enhanced space charge injection and bulk electrical field distortion, which decreased DC breakdown strength as the oxidation duration went longer, in all film thicknesses. However, such decreases in breakdown strength occurred only in films below 55 μm under AC stresses, as the enhanced electrical field distortion at the electrode-dielectric interface was more obvious and dominating in thin films. These experimental results further confirm the proposed electrode-dielectric interface breakdown of dielectric films and provide new understandings of space charge modulated electrical breakdown, which fulfills dielectric breakdown theory and benefits the miniaturization of power equipment and electronic devices.
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  • 文章类型: Journal Article
    我们直接测量由ZnO纳米线和微线金属-半导体-金属器件结构内部施加的电场驱动的本征点缺陷的三维运动。使用深度和空间分辨的阴极发光光谱(CLS)原位绘制局部缺陷密度随施加偏置增加的空间分布图,我们驱动金属-ZnO触点从整流到欧姆再返回的可逆转换。这些结果表明,缺陷运动如何系统地确定ZnO纳米线和微线的欧姆和肖特基势垒,以及它们如何解释纳米线传输中广泛报道的不稳定性。超过特征阈值电压,原位CLS揭示了电流诱导的热失控,驱动缺陷向纳米线自由表面的径向扩散,导致VO缺陷在金属-半导体界面处累积。原位后与预击穿CLS揭示微米级导线粗糙,X射线光电子能谱(XPS)发现其具有高度缺氧的表面层,这可以归因于先前存在的VO物种的迁移。这些发现表明,在纳米级电场测量过程中,操作内在点缺陷迁移的重要性。这项工作还展示了一种用于ZnO纳米线细化和处理的新方法。
    We directly measure the three-dimensional movement of intrinsic point defects driven by applied electric fields inside ZnO nano- and micro-wire metal-semiconductor-metal device structures. Using depth- and spatially resolved cathodoluminescence spectroscopy (CLS) in situ to map the spatial distributions of local defect densities with increasing applied bias, we drive the reversible conversion of metal-ZnO contacts from rectifying to Ohmic and back. These results demonstrate how defect movements systematically determine Ohmic and Schottky barriers to ZnO nano- and microwires and how they can account for the widely reported instability in nanowire transport. Exceeding a characteristic threshold voltage, in situ CLS reveals a current-induced thermal runaway that drives the radial diffusion of defects toward the nanowire free surface, causing VO defects to accumulate at the metal-semiconductor interfaces. In situ post- vs pre-breakdown CLS reveal micrometer-scale wire asperities, which X-ray photoelectron spectroscopy (XPS) finds to have highly oxygen-deficient surface layers that can be attributed to the migration of preexisting VO species. These findings show the importance of in-operando intrinsic point-defect migration during nanoscale electric field measurements in general. This work also demonstrates a novel method for ZnO nanowire refinement and processing.
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  • 文章类型: Journal Article
    在高压器件中使用的超低k材料需要机械弹性以及电气和介电稳定性,即使在受到机械负载时也是如此。具有有机聚合物的现有装置具有低的热和机械稳定性,而具有无机多孔结构的那些装置具有差的机械完整性。最近,3D中空束纳米晶格已经成为满足这些要求的有希望的候选物。然而,在应变低于25%的情况下,它们的特性仅保持五个应力周期。这里,我们证明,氧化铝纳米晶格在其高度上具有不同的相对密度分布,引起确定性机械响应,同时具有比具有均匀密度的纳米晶格高1.5-3.3倍的电击穿强度。这些密度变化的纳米晶格表现出≈1.2的超低k,并在100次循环压缩至62.5%应变时具有完全的电和介电稳定性以及机械可恢复性。我们通过双相变形解释了增强的绝缘和长期循环稳定性,其中低密度区域保护高密度区域,因为它在高密度区域之前被压缩,允许同时拥有高强度和延展性像复合材料。这项研究强调了具有单个界面的双相纳米片在提供稳定的传导和最大击穿强度方面的优异电性能。
    Ultralow-k materials used in high voltage devices require mechanical resilience and electrical and dielectric stability even when subjected to mechanical loads. Existing devices with organic polymers suffer from low thermal and mechanical stability while those with inorganic porous structures struggle with poor mechanical integrity. Recently, 3D hollow-beam nanolattices have emerged as promising candidates that satisfy these requirements. However, their properties are maintained for only five stress cycles at strains below 25%. Here, we demonstrate that alumina nanolattices with different relative density distributions across their height elicit a deterministic mechanical response concomitant with a 1.5-3.3 times higher electrical breakdown strength than nanolattices with uniform density. These density-variant nanolattices exhibit an ultralow-k of ≈1.2, accompanied by complete electric and dielectric stability and mechanical recoverability over 100 cyclic compressions to 62.5% strain. We explain the enhanced insulation and long-term cyclical stability by the bi-phase deformation where the lower-density region protects the higher-density region as it is compressed before the higher-density region, allowing to simultaneously possess high strength and ductility like composites. This study highlights the superior electrical performance of the bi-phase nanolattice with a single interface in providing stable conduction and maximum breakdown strength.
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  • 文章类型: Journal Article
    研究微米级和纳米级的能量耗散对于提高二维(2D)电子设备的性能和可靠性至关重要。最近,2D硒化铂(PtSe2)由于其独特的多功能融合而在开发下一代功能器件方面引起了广泛关注。面向PtSe2器件的实际应用,了解PtSe2与其基材之间的界面热性能至关重要。其中,热边界电导(TBC)对PtSe2器件的平面外散热起着至关重要的作用。这里,我们确定了多层PtSe2器件的能量耗散行为,并通过带有电偏压的拉曼测温法提取了PtSe2/SiO2界面的实际TBC值。获得的TBC值约为8.6MWm-2K-1,属于已知的固-固界面的低端,建议关于热电设备或其他依赖大温度梯度的可能应用。此外,PtSe2器件的最大电流密度确定其阈值功率,这对于改进设备设计和指导未来应用至关重要。因此,我们探索了多层PtSe2器件的电击穿曲线,揭示了17.7MAcm-2的击穿电流密度和0.2MWcm-2的阈值功率密度,大于常用铝和铜的典型值。这些结果为PtSe2器件的能量耗散提供了关键的见解,并使PtSe2成为热限制应用和纳米薄互连的优秀候选者。这将有利于节能功能2D设备的开发。
    Investigating the energy dissipation in micro- and nanoscale is fundamental to improve the performance and reliability of two-dimensional (2D) electronics. Recently, 2D platinum selenide (PtSe2) has drawn extensive attention in developing next-generation functional devices due to its distinctive fusion of versatile properties. Toward practical applications of PtSe2 devices, it is essential to understand the interfacial thermal properties between PtSe2 and its substrate. Among them, the thermal boundary conductance (TBC) has played a critical role for out-of-plane heat dissipation of PtSe2 devices. Here, we identify the energy dissipation behavior of multilayer PtSe2 devices and extract the actual TBC value of the PtSe2/SiO2 interface by Raman thermometry with electrical bias. The obtained TBC value is about 8.6 MW m-2 K-1, and it belongs to the low end of as-known solid-solid interfaces, suggesting possible applications regarding thermoelectric devices or others reliant on a large temperature gradient. Furthermore, the maximum current density of the PtSe2 device determines its threshold power, which is crucial for improving device design and guiding future applications. Therefore, we explore the electrical breakdown profile of the multilayer PtSe2 device, revealing the breakdown current density of 17.7 MA cm-2 and threshold power density of 0.2 MW cm-2, which are larger than typical values for commonly used aluminum and copper. These results provide key insights into the energy dissipation of PtSe2 devices and make PtSe2 an excellent candidate for thermal confinement applications and nanometer-thin interconnects, which will benefit the development of energy-efficient functional 2D devices.
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  • 文章类型: Journal Article
    已使用金属有机气相外延对一系列AlGaN/GaN高电子迁移率晶体管(HEMT)样品进行了广泛的研究,研究GaN缓冲层的生长模式对器件性能的影响。在使用我们特殊的二维(2D)生长方法生长的样品中,无意的掺杂浓度和螺钉位错密度显着降低,与广泛使用的结合2D和3D生长的两步法相比。通过2D生长方法生长的GaN缓冲层实现了2×1014cm-3的无意掺杂密度,比使用常规两步法生长的GaN样品的1016cm-3低两个数量级。高频电容测量表明,具有较低无意掺杂密度的样品具有较低的缓冲泄漏和较高的击穿极限。该系列样品的泄漏量达到了nA/mm以下,2.5MV/cm的高击穿极限,以及大约1.1A/mm的饱和电流密度。这表明我们特殊的2D生长方法可以有效地减少GaN缓冲层中的意外掺杂,导致GaN/AlGaNHEMT的低缓冲泄漏和高击穿极限。
    An extensive study has been conducted on a series of AlGaN/GaN high electron mobility transistor (HEMT) samples using metalorganic vapour phase epitaxy, to investigate the influence of growth modes for GaN buffer layers on device performance. The unintentional doping concentration and screw dislocation density are significantly lower in the samples grown with our special two-dimensional (2D) growth approach, compared to a widely-used two-step method combining the 2D and 3D growth. The GaN buffer layers grown by the 2D growth approach have achieved an unintentional doping density of 2 × 1014 cm-3, two orders lower than 1016 cm-3 of the GaN samples grown using a conventional two-step method. High-frequency capacitance measurements show that the samples with lower unintentional doping densities have lower buffer leakage and higher breakdown limits. This series of samples have attained sub-nA/mm leakages, a high breakdown limit of 2.5 MV/cm, and a saturation current density of about 1.1 A/mm. It indicates that our special 2D growth approach can effectively lessen the unintentional doping in GaN buffer layers, leading to low buffer leakage and high breakdown limits of GaN/AlGaN HEMTs.
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  • 文章类型: Journal Article
    最近,已经有许多关于利用表面处理或光敏层来改进基于2D材料的光电探测器的研究。同时,雪崩击穿现象为单光子探测器形式的光电探测提供了最终的高增益途径。这里,作者报告了基于化学气相沉积合成的单层MoS2的超灵敏雪崩光电晶体管。在照明下电击穿的较低临界场显示了由MoS2通道中的光生载流子引发的雪崩击穿的有力证据。通过利用光启动载波乘法,他们的雪崩光电探测器在低暗电流下表现出大约3.4×107AW-1的最大响应度和大约4.3×1016琼斯的探测度,比以前报告的最高值高几个数量级,尽管没有任何额外的化学处理或光敏层。超高光响应性和探测性的实现归因于通过雪崩击穿的载流子倍增与跨沟道和金属电极之间的肖特基势垒的载流子注入之间的相互作用。这项工作提出了一种简单而强大的方法,可以基于2D材料中的载流子倍增现象来增强光电探测器的性能,并提供了原子薄雪崩光电探测器的基本物理原理。
    Recently, there have been numerous studies on utilizing surface treatments or photosensitizing layers to improve photodetectors based on 2D materials. Meanwhile, avalanche breakdown phenomenon has provided an ultimate high-gain route toward photodetection in the form of single-photon detectors. Here, the authors report ultrasensitive avalanche phototransistors based on monolayer MoS2 synthesized by chemical vapor deposition. A lower critical field for the electrical breakdown under illumination shows strong evidence for avalanche breakdown initiated by photogenerated carriers in MoS2 channel. By utilizing the photo-initiated carrier multiplication, their avalanche photodetectors exhibit the maximum responsivity of ≈3.4 × 107 A W-1 and the detectivity of ≈4.3 × 1016 Jones under a low dark current, which are a few orders of magnitudes higher than the highest values reported previously, despite the absence of any additional chemical treatments or photosensitizing layers. The realization of both the ultrahigh photoresponsivity and detectivity is attributed to the interplay between the carrier multiplication by avalanche breakdown and carrier injection across a Schottky barrier between the channel and metal electrodes. This work presents a simple and powerful method to enhance the performance of photodetectors based on carrier multiplication phenomena in 2D materials and provides the underlying physics of atomically thin avalanche photodetectors.
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  • 文章类型: Journal Article
    Electrical breakdown is a critical problem in electronics. In molecular electronics, it becomes more problematic because ultrathin molecular monolayers have delicate and defective structures and exhibit intrinsically low breakdown voltages, which limit device performances. Here, we show that interstitially mixed self-assembled monolayers (imSAMs) remarkably enhance electrical stability of molecular-scale electronic devices without deteriorating function and reliability. The SAM of the sterically bulky matrix (SC11BIPY rectifier) molecule is diluted with a skinny reinforcement (SCn) molecule via the new approach, so-called repeated surface exchange of molecules (ReSEM). Combined experiments and simulations reveal that the ReSEM yields imSAMs wherein interstices between the matrix molecules are filled with the reinforcement molecules and leads to significantly enhanced breakdown voltage inaccessible by traditional pure or mixed SAMs. Thanks to this, bias-driven disappearance and inversion of rectification is unprecedentedly observed. Our work may help to overcome the shortcoming of SAM\'s instability and expand the functionalities.
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  • 文章类型: Journal Article
    经过多年的发展,摩擦电纳米发电机(TENG)已被证明是新兴的高效能量采集器。大量的努力已经致力于通过材料/表面优化进一步提高电力输出性能,离子注入或外部电路。然而,所有这些方法都无法突破不可避免的电击穿效应带来的根本限制,从而限制了输出能量密度。这里,提出了一种通过抑制高压气体环境下的击穿效应来提高TENGs阈值输出能量密度的方法。有了这个,接触分离模式TENG的输出能量密度在10个大气压下可以比大气中增加25倍以上,独立式滑动TENG的速度也可以在6个大气压下增加5倍以上。这项研究证明了高压气体环境带来的电击穿的优异抑制效果,为提高TENG的输出性能提供了一条切实有效的技术路线。
    Through years of development, the triboelectric nanogenerator (TENG) has been demonstrated as a burgeoning efficient energy harvester. Plenty of efforts have been devoted to further improving the electric output performance through material/surface optimization, ion implantation or the external electric circuit. However, all these methods cannot break through the fundamental limitation brought by the inevitable electrical breakdown effect, and thus the output energy density is restricted. Here, a method for enhancing the threshold output energy density of TENGs is proposed by suppressing the breakdown effects in the high-pressure gas environment. With that, the output energy density of the contact-separation mode TENG can be increased by over 25 times in 10 atm than that in the atmosphere, and that of the freestanding sliding TENG can also achieve over 5 times increase in 6 atm. This research demonstrates the excellent suppression effect of the electric breakdown brought by the high-pressure gas environment, which may provide a practical and effective technological route to promote the output performance of TENGs.
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  • 文章类型: Journal Article
    Carbon-based piezoresistive nanomaterials are widely used for the fabrication of flexible sensors. Although our previous work demonstrated that an electrical breakdown (EBD) process can endow a graphene/polyimide (G/PI) composite with piezoresistivity, the formation of EBD-induced electrical traces with high consistency in bulk nanocomposites remains a technical challenge. With the aim of developing highly sensitive flexible strain sensors using a batch fabrication process, we introduce herein a microscale EBD (μEBD) method to form localized piezoresistors with diverse shapes in a G/PI thin film. The results of scanning electron microscopy, Raman spectroscopy, and electromechanical tests indicate that high piezoresistivity is derived from the high porosity of the carbonized conductive traces generated by the μEBD process. The gauge factor of the μEBD-treated G/PI strain sensor is over 20 times greater than that of the as-prepared G/PI film, and the sensitivities of the strain sensors can be tuned by varying the applied current in the μEBD process. We also demonstrate the potential applications of μEBD-treated G/PI strain sensors in the fields of finger gesture detection, sound pressure measurement, and airflow sensing.
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