UV intensity

  • 文章类型: Journal Article
    不受管制的抗生素使用导致了抗生素抗性细菌(ARB)在水生环境中的增殖。紫外线发光二极管(UVLED)已经发展成为一种创新的技术,用于灭活微生物,与传统的汞灯相比,它具有许多优势。这项研究集中在利用具有三个不同波长(265nm,275nm,和285nm)以使其质粒中编码氨苄青霉素抗性blaTEM-1基因的大肠杆菌DH10β失活。非线性模型,例如Geeraerd\'s和Weibull,由于在非线性模型中结合了生物学机制和确定性方法,因此比传统的对数线性模型提供了更准确的失活谱表征。当受到UVLED照射时,ARB的失活率高于抗生素敏感细菌(ASB)。当所有微生物暴露于265nm时,观察到最高的失活率。光活化是修复由UVLED诱导的DNA损伤的主要机制。285nm在不同注量下显示出ARB的最高再激活效率。在更高的通量下,265和275nm在抑制再激活方面表现出相似的效果,而在较低的能量下,275nm在控制再活化方面表现出更好的效力。因此,对再激活的抑制作用受DNA和酶引起的损伤程度的影响。在营养贫乏的培养基(0.9%NaCl)中,ASB没有表现出任何再激活潜力。然而,加入Luria-Bertani(LB)肉汤促进了ASB的再活化。较低的通量率在265nm处更有益,而较高的通量率对于较长波长更有效。低通量下的溶解有机碳(DOC)增强了ARB的失活。然而,由于在更高的通量下存在DOC,ARB的去除减少。ARB失活的最高能量需求在285nm处报告。环境含义:抗生素的过度和不受管制的使用已成为公共卫生的重要问题。本文对UVLED的有效性进行了综合分析,一种新兴的技术,在抗生素抗性细菌(ARB)的灭活中。本研究论文探讨了不同波长的UVLED使ARB失活的动力学以及再激活效率。这项研究工作还探讨了溶解有机碳(DOC)对UVLED灭活ARB的影响和相关机理。
    Unregulated antibiotic use has led to the proliferation of antibiotic-resistant bacteria (ARB) in aquatic environments. Ultraviolet light-emitting diodes (UV LEDs) have evolved as an innovative technology for inactivating microorganisms offering several advantages over traditional mercury lamps. This research concentrated on utilizing UV LEDs with three distinct wavelengths (265 nm, 275 nm, and 285 nm) to inactivate E. coli DH10β encoding the ampicillin-resistant blaTEM-1 gene in its plasmid. Non-linear models, such as Geeraerd\'s and Weibull, provided more accurate characterization of the inactivation profiles than the traditional log-linear model due to the incorporation of both biological mechanisms and a deterministic approach within non-linear models. The inactivation rates of ARB were higher than antibiotic-sensitive bacteria (ASB) when subjected to UV LEDs. The highest inactivation rates were observed when all microorganisms were exposed to 265 nm. Photoreactivation emerged as the primary mechanism responsible for repairing DNA damage induced by UV LEDs. 285 nm showed the highest reactivation efficiencies for ARB under different fluences. At higher fluences, both 265 and 275 nm displayed similar effectiveness in suppressing reactivation, while at lower fluences, 275 nm exhibited better efficacies in controlling the reactivation. Therefore, the inhibition of reactivation was influenced by the extent of damage incurred to both DNA and enzymes. In nutrient-poor media (0.9 % NaCl), ASB did not exhibit any reactivation potential. However, the addition of Luria-Bertani (LB) broth promoted the reactivation of ASB. Lower fluence rate was more beneficial at 265 nm whereas higher fluence rates were more effective for longer wavelengths. The inactivation of ARB was enhanced by dissolved organic carbon (DOC) at low fluences. However, the removal of ARB was reduced due to the presence of DOC at higher fluences. The highest energy demand for ARB inactivation was reported at 285 nm. ENVIRONMENTAL IMPLICATION: The excessive and unregulated utilization of antibiotics has emerged as a significant issue for public health. This paper presents a comprehensive analysis of the effectiveness of UV LEDs, an emerging technology, in the inactivation of antibiotic-resistant bacteria (ARB). This research paper explores the kinetics of UV LEDs with different wavelengths to inactivate ARB along with the reactivation efficiencies. This research work also explores the impact and relevant mechanisms of the impact of dissolved organic carbon (DOC) on the inactivation of ARB by UV LEDs.
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  • 文章类型: Journal Article
    该研究考察了不同参数对通过湿法同时去除SO2和NOX的影响。已经比较了两种单独的工艺来去除烟气,即臭氧/UV和H2O2/UV。该研究旨在开展使用臭氧/H2O2和紫外光同时去除SO2和NOX的比较研究,并找到每个过程的能耗(也称为EEO)。UV与O3和H2O2的结合在产生羟基自由基中起着至关重要的作用。臭氧/H2O2、烟气、和紫外强度进行了研究,在不同的pH值和温度下的溶液,以实现最大程度的去除烟气。For,在臭氧化过程中,观察到烟气的去除率随紫外线强度的增加而增加,在较高的紫外线强度(250瓦)下,在最佳温度308K下,NOX的去除率为92%,SO2的去除率为95%。对于H2O2/UV工艺,(250W紫外线强度)在313K时,NOX的去除率为95%,SO2为100%,0.3LPM烟气流量。对于95%的NOx/SO2去除效率,两种方法获得的EEO值小于1。
    The study investigates the effect of different parameters for the removal of SO2 and NOx through a wet process concurrently. Two separate processes have been compared for the removal of flue gases, that is, Ozone/UV and H2O2/UV. The research aims to develop a comparative study for the removal of SO2 and NOx simultaneously using Ozone/H2O2 and UV light and find the energy consumption (also known as EEO) for each process. Combining UV with O3 and H2O2 play a crucial role in generating hydroxyl radicals. Different combinations of Ozone/H2O2, flue gas, and UV intensity were studied at different pH and temperatures of the solution to achieve maximum removal of the flue gases. For, the ozonation process it was observed that the removal% of flue gases increases with increasing UV intensity, and at higher UV intensity (250 W), the removal% for NOx is 92% and SO2 is 95% simultaneously at optimum temperature 308 K. For H2O2/UV process (250 W UV intensity), removal% for NOx is 95% and SO2 is 100% at 313 K, 0.3 LPM flow rate of flue gases. The EEO values obtained for both processes were less than 1 for 95% NOx/SO2 removal efficiency.
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