In situ root methods

  • 文章类型: Journal Article
    由于假定根电容(CR*)取决于茎的性质,在过去的两年中,在三个重复地块的五个小麦品种中评估了开花时测量CR*以进行全株表型鉴定的效率。线性回归分析用于将CR*与开花时的植物大小参数和旗叶性状(延伸和SPAD叶绿素含量)相关联,并在到期时具有收益率成分。地块平均CR*与地块叶面积指数(LAI)相关,叶绿素数量(LAI×SPAD),以及跨年的粮食产量。在工厂规模,发现CR*显示每个品种和年份的旗叶总叶绿素(旗叶面积×SPAD;R2:0.65-0.74)和籽粒质量(R2:0.55-0.70)的正回归最强(p<0.001)。同样,在地块规模上,品种的CR*与LAI×SPAD值(R2:0.86-0.99;p<0.01)之间的回归最强。因此,CR*表示开花时的总植物养分和光合产物供应,这取决于根系的吸收能力,并强烈影响最终产量。我们的结果表明,活性根膜表面的极化是CR*的主要贡献者,并且该测量可以适用于评估根的大小和功能强度。总之,电容法可用于无损整株植物表型鉴定,具有估计与养分供应相关的根和芽特征的潜力,预测粮食产量。CR*可以纳入谷物发育的异速生长模型,有助于优化作物管理和遗传改良。
    As root electrical capacitance (CR*) was assumed to depend on the stem properties, the efficiency of measuring CR* at flowering for whole-plant phenotyping was assessed in five wheat cultivars in three replicate plots over two years. Linear regression analysis was used to correlate CR* with plant-size parameters and flag-leaf traits (extension and SPAD chlorophyll content) at flowering, and with yield components at maturity. The plot-mean CR* was correlated with the plot leaf area index (LAI), the chlorophyll quantity (LAI×SPAD), and the grain yield across years. At plant scale, CR* was found to show the strongest positive regression with total chlorophyll in the flag leaf (flag leaf area × SPAD; R2: 0.65−0.74) and with grain mass (R2: 0.55−0.70) for each cultivar and year (p < 0.001). Likewise, at plot scale, the regression was strongest between CR* and the LAI×SPAD value (R2: 0.86−0.99; p < 0.01) for the cultivars. Consequently, CR* indicated the total plant nutrient and photosynthate supply at flowering, which depended on root uptake capacity, and strongly influenced the final yield. Our results suggested that the polarization of the active root membrane surfaces was the main contributor to CR*, and that the measurement could be suitable for evaluating root size and functional intensity. In conclusion, the capacitance method can be applied for nondestructive whole-plant phenotyping, with potential to estimate root and shoot traits linked to the nutrient supply, and to predict grain yield. CR* can be incorporated into allometric models of cereal development, contributing to optimal crop management and genetic improvement.
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  • 文章类型: Journal Article
    This study evaluated the concurrent application and the results of the root electrical capacitance (CR) and minirhizotron (MR) methods in the same plant populations. The container experiment involved three winter wheat cultivars, grown as sole crops or intercropped with winter pea under well-watered or drought-stressed conditions. The wheat root activity (characterized by CR) and the MR-based root length (RL) and root surface area (RSA) were monitored during the vegetation period, the flag leaf chlorophyll content was measured at flowering, and the wheat shoot dry mass (SDM) and grain yield (GY) were determined at maturity. CR, RL and RSA exhibited similar seasonal patterns with peaks around the flowering. The presence of pea reduced the maximum CR, RL and RSA. Drought significantly decreased CR, but increased the MR-based root size. Both intercropping and drought reduced wheat chlorophyll content, SDM and GY. The relative decrease caused by pea or drought in the maximum CR was proportional to the rate of change in SDM or GY. Significant linear correlations (R2: 0.77-0.97) were found between CR and RSA, with significantly smaller specific root capacitance (per unit RSA) for the drought-stress treatments. CR measurements tend to predict root function and the accompanying effect on above-ground production and grain yield. The parallel application of the two in situ methods improves the evaluation of root dynamics and plant responses.
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