The aim of this communication is to synthesize novel Nanocomposite thin film materials (Ag0(NP)/TiO2) using the template process. Surface morphology of materials was obtained by the Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM) analyses. The presence of doped Ag-nanoparticles was confirmed by the TEM images along with the SEM-EDX analyses. The Atomic Force Microscopic images were demonstrated the surface roughness and thickness of Nanocomposite thin films. X-ray diffraction analysis confirmed that TiO2 was predominantly present to its anatase mineral phase. The Fourier Transform Infra-red analysis conducted to obtain the functional groups present with the solid. The specific surface area and pore sizes of Nanocomposites were obtained by the BET (Brunauer, Emmett, and Teller) analysis. Further, the Nanocomposite thin film photocatalysts were successfully employed in the degradation of emerging micro-pollutants viz., the antibiotics tetracycline and sulfamethoxazole from aqueous solutions using less harmful UV-A light (λmax 330 nm). The effect of solution pH (pH 4.0-8.0) and pollutant concentrations (1.0 mg/L-20.0 mg/L (for tetracycline) and (0.5 mg/L-15.0 mg/L (for sulfamethoxazole)) was extensively studied in the photocatalytic removal of these antibiotics. A significant decrease in percentage of non-purgeable organic carbon removal indicated that the micro-pollutants was substantially mineralized by the photocatalytic treatment. The stability of thin film was assessed by the repeated use of Nanocomposite thin films and results were indicated that the degradation of tetracycline or sulfamethoxazole was almost unaffected at least for six cycles of photocatalytic operations. The presence of several cations and anions in the degradation of these antibiotics was studied. Additionally, the presence of 2-propanol and EDTA inhibited significantly the degradation of these micro-pollutants i.e., the percentage of degradation was decreased by 31.8 and 24.2% (for tetracycline) and 42.8 and 39.9% (for sulfamethoxazole), respectively. This indicated that the degradation of tetracycline or sulfamethoxazole was predominantly proceeded by the OH radicals; generated at the valance and conduction band of semiconductor. Similarly, the presence of sodium azide inhibited the percentage removal of these antibiotics.