2D semiconductors

  • 文章类型: Journal Article
    2D半导体可以推动量子科学和技术的进步。然而,他们应该没有任何污染;还有,应很好地控制相邻层的晶体学有序和耦合及其电子性质,可调,和可扩展性。这里,这些挑战通过一种新的方法来解决,在石墨烯上的半导体硒化镓(GaSe)的超高真空中结合了分子束外延和原位能带工程。通过电子衍射进行原位研究,扫描探针显微镜,和角分辨光电子能谱显示,原子薄层的GaSe在层平面中与下面的石墨烯晶格对齐。GaSe/石墨烯异质结构,被称为2semgraphene,具有GaSe的中心对称(群对称D3d)多晶型物,GaSe/石墨烯界面处的电荷偶极子,和通过层厚度可调的能带结构。新开发的,可扩展的2semgraphene用于光学传感器中,该传感器利用光活性GaSe层及其与石墨烯通道的界面处的内置电势。这种概念证明有可能进一步发展和设备架构,利用2semgraphene作为功能构建块。
    2D semiconductors can drive advances in quantum science and technologies. However, they should be free of any contamination; also, the crystallographic ordering and coupling of adjacent layers and their electronic properties should be well-controlled, tunable, and scalable. Here, these challenges are addressed by a new approach, which combines molecular beam epitaxy and in situ band engineering in ultra-high vacuum of semiconducting gallium selenide (GaSe) on graphene. In situ studies by electron diffraction, scanning probe microscopy, and angle-resolved photoelectron spectroscopy reveal that atomically-thin layers of GaSe align in the layer plane with the underlying lattice of graphene. The GaSe/graphene heterostructure, referred to as 2semgraphene, features a centrosymmetric (group symmetry D3d) polymorph of GaSe, a charge dipole at the GaSe/graphene interface, and a band structure tunable by the layer thickness. The newly-developed, scalable 2semgraphene is used in optical sensors that exploit the photoactive GaSe layer and the built-in potential at its interface with the graphene channel. This proof of concept has the potential for further advances and device architectures that exploit 2semgraphene as a functional building block.
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  • 文章类型: Journal Article
    二维(2D)半导体场效应膜晶体管将大的载流子迁移率与机械灵活性相结合,因此可以理想地适用于可穿戴电子设备或智能传感器系统的传感器接口处。然而,这种应用需要大面积的溶液处理,而不是单片设备,其中要克服的关键挑战是高的交错电阻值。在这份报告中,使用窄通道,近垂直运输装置架构,我们已经制造了喷墨打印的亚20nm通道电解质栅极晶体管,主要具有内部色列湖载流子传输。因此,这些晶体管中的电子传输不受高交错电阻的支配,以及包括掺杂密度在内的湖内材料特性,缺陷浓度,接触电阻,可以独立地检查和优化阈值电压调制,以实现高达280μA·μm-1的电流密度。此外,通过定制的表面处理钝化硫空位,我们展示了令人印象深刻的通断电流比超过1×107,并辅以100mV·decade-1的低亚阈值摆幅。接下来,利用这些高性能晶体管,单极耗尽型负载型逆变器的最大增益为31。此外,我们已经意识到NAND,NOR,和或门,演示其无缝操作在1kHz的频率。因此,这项工作代表了实现基于印刷2D薄膜晶体管的电子电路的重要一步。
    Two-dimensional (2D) semiconductor field-effect film transistors combine large carrier mobility with mechanical flexibility and therefore can be ideally suitable for wearable electronics or at the sensor interfaces of smart sensor systems. However, such applications require large-area solution processing as opposed to single-flake devices, where the critical challenge to overcome is the high interflake resistance values. In this report, using a narrow-channel, near-vertical transport device architecture, we have fabricated inkjet-printed sub-20 nm channel electrolyte-gated transistors with predominantly intraflake carrier transport. Therefore, the electronics transport in these transistors is not dominated by the high interflake resistance, and the intraflake material properties including doping density, defect concentration, contact resistance, and threshold voltage modulation can be examined and optimized independently to achieve a current density as high as 280 μA·μm-1. In addition, through the passivation of the sulfur vacancies with a tailored surface treatment, we demonstrate an impressive On-Off current ratio exceeding 1 × 107, complemented by a low subthreshold swing of 100 mV·decade-1. Next, exploiting these high-performance transistors, unipolar depletion-load-type inverters have been fabricated that show a maximum gain of 31. Furthermore, we have realized NAND, NOR, and OR gates, demonstrating their seamless operation at a frequency of 1 kHz. Therefore, this work represents an important step forward to realize electronic circuits based on printed 2D thin film transistors.
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  • 文章类型: Journal Article
    通过范德华(vdW)异质结构的组装来操纵二维(2D)材料中的激子发射为设计其光子和光电特性提供了许多机会。在这项工作中,我们介绍一类混合维vdW异质结构,将2D材料与由vdW层组成的一维(1D)半导体纳米线集成。这种构型通过定制的界面异质层原子排列诱导空间上不同的局部激子发射。通过精确调整自下而上生长的PbI2vdW纳米线的轴向和侧壁刻面取向,并将它们转移到1LWSe2薄片上,我们建立了具有垂直或平行原子间排列的vdW异质界面。边缘站立的异质结,在WSe2上具有垂直的PbI2层,促进通过边缘和耦合局部状态的有效电荷转移,导致增强的红移激子发射。相反,逐层异质界面,其中PbI2层与WSe2平行接触,由于II型排列中的深中隙状态而表现出实质性的猝灭,功率相关测量和第一原理计算证明了这一点。我们的结果介绍了一种通过边缘工程主动操纵2D过渡金属二硫属化合物(TMD)中的激子发射的方法,突出了它们在各种量子器件开发中的潜力。
    Manipulation of excitonic emission in two-dimensional (2D) materials via the assembly of van der Waals (vdW) heterostructures unlocks numerous opportunities for engineering their photonic and optoelectronic properties. In this work, we introduce a category of mixed-dimensional vdW heterostructures, integrating 2D materials with one-dimensional (1D) semiconductor nanowires composed of vdW layers. This configuration induces spatially distinct localized excitonic emissions through a tailored interfacial heterolayer atomic arrangement. By precisely adjusting both the axial and sidewall facet orientations of bottom-up grown PbI2 vdW nanowires and by transferring them onto 1L WSe2 flakes, we establish vdW heterointerfaces with either perpendicular or parallel interatomic arrangements. The edge-standing heterojunction, featuring perpendicular PbI2 layers atop WSe2, promotes efficient charge transfer through the edges and coupled localized states, leading to an enhanced redshifted excitonic emission. Conversely, the layer-by-layer heterointerface, where PbI2 layers are in parallel contact with WSe2, exhibits substantial quenching due to deep midgap states in a type-II alignment, as evidenced by power-dependent measurements and first-principle calculations. Our results introduce a method for actively manipulating excitonic emissions in 2D transition metal dichalcogenides (TMDs) through edge engineering, highlighting their potential in the development of various quantum devices.
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  • 文章类型: Journal Article
    二维(2D)弯曲时空中的奇异期望之一是来自2D空间曲率的几何势,通过狄拉克量化仍然拥有未解决的基本问题。原子薄的二维材料有望实现几何势,但是二维材料中的几何势没有通过实验确定。这里,我们观察到结构变形的二维半导体中的曲率诱导的环形约束态,并为曲率效应制定了修改的几何势,它演示了具有角动量的环形束下态。公式化的修改后的几何势类似于旋转带电黑洞的有效势。进行了密度泛函理论(DFT)和紧密结合计算,这在数量上与修正的几何势的结果非常吻合。修正的几何势通过修正的高斯和平均曲率来描述,对应于曲率引起的自旋轨道相互作用和带隙的变化,分别。即使是复杂的结构变形,几何势解决了复杂性,与实验结果吻合良好。对修改后的几何势的理解为我们提供了量子传输的直观线索,也为山谷电子学等新的量子应用提供了关键因素,自旋电子学,和二维半导体中的应变。本文受版权保护。保留所有权利。
    One of the exotic expectations in the 2D curved spacetime is the geometric potential from the curvature of the 2D space, still possessing unsolved fundamental questions through Dirac quantization. The atomically thin 2D materials are promising for the realization of the geometric potential, but the geometric potential in 2D materials is not identified experimentally. Here, the curvature-induced ring-patterned bound states are observed in structurally deformed 2D semiconductors and formulated the modified geometric potential for the curvature effect, which demonstrates the ring-shape bound states with angular momentum. The formulated modified geometric potential is analogous to the effective potential of a rotating charged black hole. Density functional theory and tight-binding calculations are performed, which quantitatively agree well with the results of the modified geometric potential. The modified geometric potential is described by modified Gaussian and mean curvatures, corresponding to the curvature-induced changes in spin-orbit interaction and band gap, respectively. Even for complex structural deformation, the geometric potential solves the complexity, which aligns well with experimental results. The understanding of the modified geometric potential provides us with an intuitive clue for quantum transport and a key factor for new quantum applications such as valleytronics, spintronics, and straintronics in 2D semiconductors.
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  • 文章类型: Journal Article
    促进高质量接口和紧密静电控制的栅极堆叠对于实现高性能和低功率场效应晶体管(FET)至关重要。然而,当构建具有二维(2D)过渡金属二硫属化物通道的常规金属氧化物半导体结构时,由于通过自然氧化或膜沉积获得高质量栅极电介质的固有困难,实现这些要求变得具有挑战性。这里,我们报告了使用二硫化钼(MoS2)沟道和表面氧化的金属栅极(例如镍和铜)的范德华肖特基门控金属半导体FET(vdW-SGMESFET)的无栅极电介质器件架构。得益于强SG耦合,我们的MESFET在极低的栅极电压下工作,<0.5V.值得注意的是,它们还表现出玻尔兹曼限制的开关行为,其特征是约60mV/dec的亚阈值摆动和可忽略的滞后。这些理想的FET特性归因于在肖特基-莫特极限处形成费米能级(EF)无钉扎栅极堆叠。此外,我们在实验和理论上证实,可以通过在单片氧化物间隙金属栅极和MoS2沟道之间的界面处抑制金属诱导和无序诱导的间隙状态来实现EF脱钉。这项工作为设计高性能和节能的2D电子产品铺平了一条新途径。本文受版权保护。保留所有权利。
    A gate stack that facilitates a high-quality interface and tight electrostatic control is crucial for realizing high-performance and low-power field-effect transistors (FETs). However, when constructing conventional metal-oxide-semiconductor structures with two-dimensional (2D) transition metal dichalcogenide channels, achieving these requirements becomes challenging due to inherent difficulties in obtaining high-quality gate dielectrics through native oxidation or film deposition. Here, a gate-dielectric-less device architecture of van der Waals Schottky gated metal-semiconductor FETs (vdW-SG MESFETs) using a molybdenum disulfide (MoS2) channel and surface-oxidized metal gates such as nickel and copper is reported. Benefiting from the strong SG coupling, these MESFETs operate at remarkably low gate voltages, <0.5 V. Notably, they also exhibit Boltzmann-limited switching behavior featured by a subthreshold swing of ≈60 mV dec-1 and negligible hysteresis. These ideal FET characteristics are attributed to the formation of a Fermi-level (EF) pinning-free gate stack at the Schottky-Mott limit. Furthermore, authors experimentally and theoretically confirm that EF depinning can be achieved by suppressing both metal-induced and disorder-induced gap states at the interface between the monolithic-oxide-gapped metal gate and the MoS2 channel. This work paves a new route for designing high-performance and energy-efficient 2D electronics.
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  • 文章类型: Journal Article
    2D半导体具有有趣的物理和化学属性,这使得它们成为最近历史上研究最深入的半导体家族之一。它们可能在电子学以及光电子学或光子学的下一次技术革命中发挥关键作用。从这个角度来看,我们探索了包括2D半导体的电子和光子器件的基本原理和重大进展。我们专注于旨在提高传统器件性能和利用2D半导体的重要特性的策略,这些特性为未来的应用提供了令人感兴趣的器件功能。实现新兴逻辑晶体管和存储器件以及光伏器件的方法,光电探测器,电光调制器,讨论了基于二维半导体的非线性光学。我们还为2D半导体的基础科学和技术应用提供了关键的剩余挑战和机遇的前瞻性视角。
    2D semiconductors have interesting physical and chemical attributes that have led them to become one of the most intensely investigated semiconductor families in recent history. They may play a crucial role in the next technological revolution in electronics as well as optoelectronics or photonics. In this Perspective, we explore the fundamental principles and significant advancements in electronic and photonic devices comprising 2D semiconductors. We focus on strategies aimed at enhancing the performance of conventional devices and exploiting important properties of 2D semiconductors that allow fundamentally interesting device functionalities for future applications. Approaches for the realization of emerging logic transistors and memory devices as well as photovoltaics, photodetectors, electro-optical modulators, and nonlinear optics based on 2D semiconductors are discussed. We also provide a forward-looking perspective on critical remaining challenges and opportunities for basic science and technology level applications of 2D semiconductors.
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  • 文章类型: Journal Article
    2D材料的电子特性受到其界面处的分子活性的高度影响。提出了一种通过采用使用单层MoS2场效应晶体管(FET)的钝化技术同时保持高性能来解决此问题的方法。在这里,我们使用碱金属氟化物作为介电覆盖层,包括氟化锂(LiF),氟化钠(NaF),和氟化钾(KF)介电覆盖层,减轻氧气和水暴露对环境的影响。其中,LiF介电覆盖层显著提高了晶体管的性能,特别是在从74到137cm2/V·s的增强场效应迁移率方面,在漏极电压Vd为1V时,电流密度从17μA/μm增加到32.13μA/μm,并将亚阈值摆动降低至0.8V/dec。结果已通过X射线光电子能谱(XPS)和拉曼分析验证,和光致发光(PL)光谱,并且演示的技术可以扩展到其他过渡金属二硫属(TMD)基FET,这可以成为尖端电子应用的前景。这些发现突出了某些重要的权衡,并提供了对界面控制和钝化材料选择对电稳定性的重要性的见解。性能,以及MoS2FET的增强。
    The electronic properties of 2D materials are highly influenced by the molecular activity at their interfaces. A method was proposed to address this issue by employing passivation techniques using monolayer MoS2 field-effect transistors (FETs) while preserving high performance. Herein, we have used alkali metal fluorides as dielectric capping layers, including lithium fluoride (LiF), sodium fluoride (NaF), and potassium fluoride (KF) dielectric capping layers, to mitigate the environmental impact of oxygen and water exposure. Among them, the LiF dielectric capping layer significantly improved the transistor performance, specifically in terms of enhanced field effect mobility from 74 to 137 cm2/V·s, increased current density from 17 μA/μm to 32.13 μA/μm at a drain voltage of Vd of 1 V, and decreased subthreshold swing to 0.8 V/dec The results have been analytically verified by X-ray photoelectron spectroscopy (XPS) and Raman, and photoluminescence (PL) spectroscopy, and the demonstrated technique can be extended to other transition metal dichalcogenide (TMD)-based FETs, which can become a prospect for cutting-edge electronic applications. These findings highlight certain important trade-offs and provide insight into the significance of interface control and passivation material choice on the electrical stability, performance, and enhancement of the MoS2 FET.
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  • 文章类型: Journal Article
    单层2D半导体,例如WS2由于激子共振而表现出独特的强的光-物质相互作用,所述激子共振使得能够实现原子级薄的光学元件。类似于几何依赖的等离子体激元和Mie共振,这些固有的材料共振提供相干和可调的光散射。到目前为止,激子的时间动力学对这种激子超表面性能的影响仍未被探索。这里,我们展示了激子衰减率如何决定直接从剥离的单层WS2雕刻出的原子级薄透镜的聚焦效率。通过将相干激子辐射与透镜焦点中的非相干背景隔离,我们可以直接测量激子辐射在波前整形中的作用。此外,我们通过表征聚焦效率作为温度的函数来研究激子-声子散射的影响,证明了在低温下光学效率的提高。我们的结果为激子光散射在2D纳米光子器件中的作用提供了有价值的见解。
    Monolayer 2D semiconductors, such as WS2, exhibit uniquely strong light-matter interactions due to exciton resonances that enable atomically thin optical elements. Similar to geometry-dependent plasmon and Mie resonances, these intrinsic material resonances offer coherent and tunable light scattering. Thus far, the impact of the excitons\' temporal dynamics on the performance of such excitonic metasurfaces remains unexplored. Here, we show how the excitonic decay rates dictate the focusing efficiency of an atomically thin lens carved directly out of exfoliated monolayer WS2. By isolating the coherent exciton radiation from the incoherent background in the focus of the lens, we obtain a direct measure of the role of exciton radiation in wavefront shaping. Furthermore, we investigate the influence of exciton-phonon scattering by characterizing the focusing efficiency as a function of temperature, demonstrating an increased optical efficiency at cryogenic temperatures. Our results provide valuable insights into the role of excitonic light scattering in 2D nanophotonic devices.
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  • 文章类型: Journal Article
    曲率是各种二维(2D)材料的一般因素,由于它们的灵活性,尚未完全公开以控制其物理性质。特别是,具有随机曲率形成的结构无序对2D半导体中激子的影响尚未完全理解。这里,通过使用光致发光(PL)和拉曼光谱研究了SiO2上单层MoS2中结构无序与激子形成之间的相关性。我们发现,曲率引起的电荷局部化以及带隙波动有助于形成局部带电激子(例如trions)。在衬底支撑区域中,由于微观随机弯曲应变,三子群被局部电荷增强,而三亚子在悬浮区域被抑制,表现出可忽略不计的弯曲应变,即使介电屏蔽效应低于支撑区域,也是异常的。每个激子的再分布的弯曲应变导致一个巨大的变化(〜100倍)的PL强度之间的支持和悬浮区域,不能完全理解外部潜在的障碍,如随机分布的带电杂质。PL在MoS2/SiO2中的峰位置与E12g的拉曼峰位置成反比,表明弯曲应变与PL相关。支撑区域表现出在悬置区域或原子平坦基底中未显示的间接部分。对激子结构无序效应的理解为二维半导体的光电子学和应变工程提供了基本途径。
    Curvature is a general factor for various two-dimensional (2D) materials due to their flexibility, which is not yet fully unveiled to control their physical properties. In particular, the effect of structural disorder with random curvature formation on excitons in 2D semiconductors is not fully understood. Here, the correlation between structural disorder and exciton formation in monolayer MoS2 on SiO2 was investigated by using photoluminescence (PL) and Raman spectroscopy. We found that the curvature-induced charge localization along with band gap fluctuations aid the formation of the localized charged excitons (such as trions). In the substrate-supported region, the trion population is enhanced by a localized charge due to the microscopic random bending strain, while the trion is suppressed in the suspended region which exhibits negligible bending strain, anomalously even though the dielectric screening effect is lower than that of the supported region. The redistribution of each exciton by the bending strain leads to a huge variation (∼100-fold) in PL intensity between the supported and suspended regions, which cannot be fully comprehended by external potential disorders such as a random distribution of charged impurities. The peak position of PL in MoS2/SiO2 is inversely proportional to the Raman peak position of E12g, indicating that the bending strain is correlated with PL. The supported regions exhibit an indirect portion that was not shown in the suspended regions or atomically flat substrates. The understanding of the structural disorder effect on excitons provides a fundamental path for optoelectronics and strain engineering of 2D semiconductors.
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  • 文章类型: Journal Article
    由于二维(2D)半导体在未来集成电子和光电器件中的应用前景广阔,因此最近引起了广泛关注。大规模合成高质量的2D半导体是实际应用越来越重要的要求,比如感应,成像,和通信。在这项工作中,通过分子束外延(MBE)在氟金云母云母衬底上外延生长厘米级的均匀2DGaTe薄膜。外延GaTe薄膜显示出具有T相的原子2D分层晶格结构,在GaTe几何异构体中尚未发现。此外,在T-GaTe外延膜中发现了室温以上的半导体行为和高迁移率,这对于在半导体器件中的应用是必不可少的。基于T-GaTe的光电探测器表现出良好的光电探测性能,响应度为13mA/W,响应速度快。通过引入单层石墨烯作为基底,我们成功实现了高质量的GaTe/石墨烯异质结构。性能有了明显的提高,如响应度提高了20倍以上。这些结果突出了探索2DGaTe晶相并实现在大衬底上控制生长GaTe薄膜的可行方案,这可以促进宽带的发展,高性能,和大规模光电探测应用。
    Two-dimensional (2D) semiconductors have recently attracted considerable attention due to their promising applications in future integrated electronic and optoelectronic devices. Large-scale synthesis of high-quality 2D semiconductors is an increasingly essential requirement for practical applications, such as sensing, imaging, and communications. In this work, homogeneous 2D GaTe films on a centimeter scale are epitaxially grown on fluorphlogopite mica substrates by molecular beam epitaxy (MBE). The epitaxial GaTe thin films showed an atomically 2D layered lattice structure with a T phase, which has not been discovered in the GaTe geometric isomer. Furthermore, semiconducting behavior and high mobility above room temperature were found in T-GaTe epitaxial films, which are essential for application in semiconducting devices. The T-GaTe-based photodetectors demonstrated respectable photodetection performance with a responsivity of 13 mA/W and a fast response speed. By introducing monolayer graphene as the substrate, we successfully realized high-quality GaTe/graphene heterostructures. The performance has been significantly improved, such as the responsivity was enhanced more than 20 times. These results highlight a feasible scheme for exploring the crystal phase of 2D GaTe and realizing the controlled growth of GaTe films on large substrates, which could promote the development of broadband, high-performance, and large-scale photodetection applications.
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