■进行了这项初步研究,以评估使用半导体剂量计获得的半值层(HVL)测量值用于口腔内射线照相术。
■这项研究包括8个铝板,其中4个为低纯度(小于99.9%)和4个为高纯度(大于99.9%)。在作者的附属医院:管电压,60kVp和70kVp;管电流,7mA;和暴露时间,0.10s。使用半导体剂量计评估口腔内射线照相术的HVL测量的准确性。进行了简单的回归分析,以比较铝板厚度和HVL与管电压(60kVp和70kVp)和铝纯度(低和高)的关系。
■对于低纯度铝板,在60kVp(Y)和70kVp(Y)的HVL与铝板的厚度(X)显着相关,Y=1.708+0.415X(r=0.999,P<0.05),Y=1.980+0.484X(r=0.999,P<0.05),分别。同样,对于高纯度铝板,在60kVp(Y)和70kVp(Y)的HVL与板厚度(X)显着相关,Y=1.696+0.454X(r=0.999,P<0.05),Y=1.968+0.515X(r=0.998,P<0.05),分别。
■这项初步研究检查了使用半导体剂量计进行口腔内射线照相术的铝板厚度与HVL测量之间的关系。半导体剂量计可以证明在HVL测量中是有用的,用于诸如牙科X射线成像中的质量保证的目的。
UNASSIGNED: This pilot
study was conducted to evaluate half-value layer (HVL) measurements obtained using a semiconductor dosimeter for intraoral radiography.
UNASSIGNED: This
study included 8 aluminum plates, 4 of which were low-purity (less than 99.9%) and 4 high-purity (greater than 99.9%). Intraoral radiography was performed using an intraoral X-ray unit in accordance with the dental protocol at the authors\' affiliated hospital: tube voltage, 60 kVp and 70 kVp; tube current, 7 mA; and exposure time, 0.10 s. The accuracy of HVL measurements for intraoral radiography was assessed using a semiconductor dosimeter. A simple regression analysis was performed to compare the aluminum plate thickness and HVL in relation to the tube voltage (60 kVp and 70 kVp) and aluminum purity (low and high).
UNASSIGNED: For the low-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the thickness of the aluminum plate (X), with Y = 1.708 + 0.415X (r=0.999, P<0.05) and Y = 1.980 + 0.484X (r=0.999, P<0.05), respectively. Similarly, for the high-purity aluminum plates, the HVL at 60 kVp (Y) and 70 kVp (Y) was significantly correlated with the plate thickness (X), with Y = 1.696 + 0.454X (r=0.999, P<0.05) and Y = 1.968 + 0.515X (r=0.998, P<0.05), respectively.
UNASSIGNED: This pilot
study examined the relationship between aluminum plate thickness and HVL measurements using a semiconductor dosimeter for intraoral radiography. Semiconductor dosimeters may prove useful in HVL measurement for purposes such as quality assurance in dental X-ray imaging.