{Reference Type}: Journal Article
{Title}: Designing Rewritable Dual-Mode Patterns using a Stretchable Photoresponsive Polymer via Orthogonal Photopatterning.
{Author}: Xu WC;Liu C;Liang S;Zhang D;Liu Y;Wu S;Xu WC;Liu C;Liang S;Zhang D;Liu Y;Wu S;
{Journal}: Adv Mater
{Volume}: 34
{Issue}: 31
{Year}: Aug 2022
{Factor}: 32.086
{DOI}: 10.1002/adma.202202150
{Abstract}: The fabrication of dual-mode patterns in the same region of a material is a promising approach for high-density information storage, new anti-counterfeiting technologies, and highly secure encryption. However, dual-mode patterns are difficult to achieve because the two patterns in one material may interfere with each other during fabrication and usage. The development of noninterfering dual-mode patterns requires new materials and patterning techniques. Herein, a novel orthogonal photopatterning technique is reported for the fabrication of noninterfering dual-mode patterns on an azopolymer P1. P1 is a unique material that exhibits both photoinduced reversible solid-to-liquid transitions and good stretchability. In the first step of orthogonal photopatterning, patterned photonic structures are fabricated on a P1 film via masked nanoimprinting controlled by photoinduced reversible solid-to-liquid transitions. In the second step, the P1 film is stretched and irradiated with polarized light through a photomask, which generates a chromatic polarization pattern. In particular, the photonic structures and chromatic polarization in the dual-mode pattern are noninterfering. Another feature of dual-mode patterns is that they are rewritable via photo-, thermal, or solution reprocessing, which are useful for recycling and reprogramming. This study opens an avenue for the development of novel materials and techniques for photopatterning.