PDF(Pubmed)
Abstract：
The preoperative serum levels and postoperative serum levels of titanium, cobalt and aluminium from dental implants in order to assess the release of these ions and to assess any risk of toxicity from these ions after dental implant placement is of interest to dentists. It was observed that there was very slight increase in serum concentration of titanium, cobalt and aluminium after 12 months of placement of implants as compared to before placement of implants. However the increase was non-significant statistically. Our study concluded that the use of dental implants does not pose any risk of toxicity of metal ions like titanium, aluminium and cobalt because of very slight non-significant increase in serum levels of these ions 12 months after implant placement.
摘要：
术前血清和术后血清钛，牙科植入物中的钴和铝，以评估这些离子的释放，并评估牙科植入物放置后这些离子的任何毒性风险。观察到钛的血清浓度有非常轻微的增加，与植入物放置前相比，植入物放置12个月后的钴和铝。然而,增加在统计学上并不显著。我们的研究得出结论，使用牙科植入物不会对金属离子（如钛）产生任何毒性风险，铝和钴，因为这些离子的血清水平在植入物放置后12个月非常轻微的不显著增加。
