关键词: Biochemical responses Biomarkers Freshwater Metals Physiological effect e-waste

来  源:   DOI:10.1007/s10646-024-02784-6

Abstract:
Electronic waste (e-waste) has been identified as an emerging pollutant and is the fastest growing waste stream at the present time. Significant technological development and modernization within the last decade has led to the rapid accumulation of outdated, broken and unwanted electrical and electronic equipment (EEE). Electronic products mainly consist of a range of metal containing components that, when disposed of improperly, could result in metal constituents leached into the environment and posing a health risk to humans and animals alike. Metal exposure can induce oxidative stress in organisms, which could lead to synergistic, antagonistic and additive effects. The metals found highest in abundance in the simulated e-waste leachate, were nickel (Ni), barium (Ba), zinc (Zn), lithium (Li), iron (Fe), aluminium (Al) and copper (Cu). An acute exposure study was conducted over a 96 h period to determine the potential toxicity of e-waste on the test organism Danio rerio. Biomarker analysis results to assess the biochemical and physiological effects induced by e-waste leachate, showed a statistically significant effect induced on acetylcholinesterase activity, superoxide dismutase, catalase activity, reduced glutathione content, glutathione s-transferase, malondialdehyde and glucose energy available. The Integrated Biomarker Response (IBRv2) analysis revealed a greater biomarker response induced as the exposure concentration of e-waste leachate increased.
摘要:
电子废物(电子废物)已被确定为新兴污染物,是目前增长最快的废物流。在过去的十年中,重大的技术发展和现代化导致了过时的快速积累,损坏和不需要的电气和电子设备(EEE)。电子产品主要由一系列含金属成分组成,当处理不当时,可能导致金属成分渗入环境,对人类和动物都构成健康风险。金属暴露可以诱导生物体的氧化应激,这可能会导致协同作用,拮抗和加性效应。在模拟的电子垃圾渗滤液中发现的金属丰度最高,镍(Ni),钡(Ba),锌(Zn),锂(Li),铁(Fe),铝(Al)和铜(Cu)。进行了96小时的急性暴露研究,以确定电子废物对测试生物Daniorerio的潜在毒性。生物标志物分析结果,以评估电子垃圾渗滤液诱导的生化和生理效应,显示对乙酰胆碱酯酶活性诱导的统计学显著影响,超氧化物歧化酶,过氧化氢酶活性,谷胱甘肽含量降低,谷胱甘肽S-转移酶,丙二醛和葡萄糖能量可用。综合生物标志物响应(IBRv2)分析显示,随着电子垃圾渗滤液的暴露浓度增加,会引起更大的生物标志物响应。
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