关键词: BSA N-oxide QCM-D adsorption antifouling surface modification zwitterionic polymer

来  源:   DOI:10.3390/polym16121634   PDF(Pubmed)

Abstract:
Biofouling is a great challenge for engineering material in medical-, marine-, and pharmaceutical-related applications. In this study, a novel trimethylamine N-oxide (TMAO)-analog monomer, 3-(2-methylacrylamido)-N,N-dimethylpropylamine N-oxide (MADMPAO), was synthesized and applied for the grafting of poly(MADMPAO) (pMPAO) brushes on quartz crystal microbalance (QCM) chips by the combination of bio-inspired poly-dopamine (pDA) and surface-initiated atom transfer radical polymerization technology. The result of ion adsorption exhibited that a sequential pDA and pMPAO arrangement from the chip surface had different characteristics from a simple pDA layer. Ion adsorption on pMPAO-grafted chips was greatly inhibited at low salt concentrations of 1 and 10 mmol/L due to strong surface hydration in the presence of charged N+ and O- of zwitterionic pMPAO brushes on the outer layer on the chip surface, well known as the \"anti-polyelectrolyte\" effect. During BSA adsorption, pMPAO grafting also led to a marked decrease in frequency shift, indicating great inhibition of protein adsorption. It was attributed to weaker BSA-pMPAO interaction. In this study, the Au@pDA-4-pMPAO chip with the highest coating concentration of DA kept stable dissipation in BSA adsorption, signifying that the chip had a good antifouling property. The research provided a novel monomer for zwitterionic polymer and demonstrated the potential of pMPAO brushes in the development and modification of antifouling materials.
摘要:
生物污染是医学工程材料面临的巨大挑战。marine-,和制药相关的应用。在这项研究中,一种新型的三甲胺N-氧化物(TMAO)-类似物单体,3-(2-甲基丙烯酰胺基)-N,N-二甲基丙胺N-氧化物(MADMPAO),通过结合生物激发的聚多巴胺(pDA)和表面引发的原子转移自由基聚合技术,合成了聚(MADMPAO)(pMPAO)刷在石英晶体微天平(QCM)芯片上的接枝。离子吸附的结果表明,从芯片表面开始的顺序pDA和pMPAO排列具有与简单pDA层不同的特性。在1和10mmol/L的低盐浓度下,由于在芯片表面外层上两性离子pMPAO刷的带电N和O-存在下,强烈的表面水合作用,在pMPAO接枝芯片上的离子吸附受到极大抑制,众所周知的“抗聚电解质”效应。在BSA吸附过程中,pMPAO嫁接也导致频移明显减少,表明对蛋白质吸附有很大的抑制作用。这归因于较弱的BSA-pMPAO相互作用。在这项研究中,DA涂层浓度最高的Au@pDA-4-pMPAO芯片在BSA吸附中保持稳定的耗散,表明该芯片具有良好的防污性能。该研究为两性离子聚合物提供了一种新型单体,并证明了pMPAO刷在防污材料开发和改性中的潜力。
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