PDF(Pubmed)
Abstract：
A promising pollution control technology is cold plasma driven chemical processing. The plasma is a pulsed electric gas discharge inside a near atmospheric-pressure-temperature reactor. The system is energized by a continuous stream of very short high-voltage pulses. The exhaust gas to be treated flows through the reactor. The methods applied involve the development of robust cold plasma systems, industrial applications and measuring technologies. Tests of the systems were performed at many industrial sites and involved control of airborne VOC (volatile organic compound) and odor. Electrical, chemical and odor measuring data were collected with state-of-the-art methods. To explain the test data an approximate solution of global reaction kinetics of pulsed plasma chemistry was developed. It involves the Lambert function and, for convenience, a simple approximation of it. The latter shows that the amount of removal, in good approximation, is a function of a single variable. This variable is electric plasma power divided by gas flow divided by input concentration. In the results sections we show that in some cases up to 99% of volatile pollution can be removed at an acceptable energy requirement. In the final sections we look into future efficiency enhancements by implementation of (sub)nanosecond pulsed plasma and solid state high-voltage technology and by integration with catalyst technology.
摘要：
一种有前途的污染控制技术是冷等离子体驱动的化学处理。等离子体是在接近大气压-温度的反应器内的脉冲电气体放电。该系统由非常短的高压脉冲的连续流供电。待处理的废气流过反应器。应用的方法涉及开发强大的冷等离子体系统，工业应用和测量技术。在许多工业现场进行了系统测试，涉及控制空气中的VOC（挥发性有机化合物）和气味。电气,用最先进的方法收集化学和气味测量数据。为了解释测试数据，开发了脉冲等离子体化学的整体反应动力学的近似解。它涉及到兰伯特函数，为方便起见,一个简单的近似。后者表明，去除量，在很好的近似中，是单个变量的函数。该变量是电等离子体功率除以气流除以输入浓度。在结果部分中，我们表明，在某些情况下，可以在可接受的能量需求下去除高达99％的挥发性污染。在最后部分中，我们将通过实施（亚）纳秒脉冲等离子体和固态高压技术以及与催化剂技术的集成来探讨未来的效率提高。
