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Abstract：
In this study, an optical investigation in a wide spectral range of polymer-like (SiOxCyHz) thin films deposited by plasma-enhanced chemical vapor deposition (PECVD) is presented. The primary focus is on assessing the homogeneity of the grown films. Within the PECVD, it is possible to alter the properties of the deposited material by continually adjusting deposition process parameters and hence allow for the growth of inhomogeneous layers. However, as shown in this study, the growth of homogeneous layers could be similarly challenging. This challenge is especially pronounced at the beginning of the deposition process, where it is necessary to consider the influence of the substrate among other factors, as even slight variations in the deposition conditions can lead to the formation of inhomogeneous layers. Several series of polymer-like thin films were deposited onto silicon substrates with the goal of producing homogeneous layers, i.e. all deposition parameters were held constant. These samples were optically characterized with a special interest in homogeneity, especially at the beginning of the growth. It was found that initial inhomogeneous growth is always present. The thickness of the initial inhomogeneous part was found to be surprisingly large.
摘要：
在这项研究中,提出了通过等离子体增强化学气相沉积（PECVD）沉积的聚合物状（SiOxCyHz）薄膜的宽光谱范围内的光学研究。主要的焦点是评估生长膜的均匀性。在PECVD中,例如,可以通过连续地调整沉积工艺参数来改变沉积材料的性质,并且因此允许不均匀层的生长。然而,如这项研究所示，同质层的生长可能同样具有挑战性。这一挑战在沉积过程开始时尤其明显，在有必要考虑基材的影响以及其他因素的情况下，即使沉积条件的轻微变化也会导致不均匀层的形成。为了产生均匀的层，在硅衬底上沉积了几个系列的聚合物状薄膜，即所有沉积参数保持恒定。对这些样品进行了光学表征，对均匀性具有特殊的兴趣，尤其是在成长的初期。发现最初的不均匀生长总是存在的。发现初始不均匀部分的厚度令人惊讶地大。
