PDF(Pubmed)
Abstract：
We introduce a unique soft lithographic operation that exploits stamp roof collapse-induced gaps to selectively remove an alkanethiol self-assembled monolayer (SAM) on Au to generate surface patterns that are orders of magnitude smaller than structures on the original elastomer stamp. The smallest achieved feature dimension is 5 nm using a micrometer-scale structured stamp in a chemical lift-off lithography (CLL) process. Molecular patterns retained in the gaps between stamp features and their circumscribed or inscribed circles follow mathematical predictions, and their sizes can be tuned by altering the stamp structure dimensions, including height, pitch, and shape. These generated surface molecular patterns can function as biorecognition arrays or be transferred to the underneath Au layer for metallic structure creation. By combining CLL process with this gap phenomenon, soft material properties that are previously thought as demerits can be used to achieve sub-10 nm features in a straightforward sketch.
摘要：
我们引入了一种独特的软光刻操作，该操作利用了邮票屋顶塌陷引起的间隙来选择性地去除Au上的烷硫醇自组装单层（SAM），以生成比原始弹性体邮票上的结构小几个数量级的表面图案。在化学剥离光刻(CLL)工艺中使用微米级结构化印模,实现的最小特征尺寸为5nm。保留在印章特征与其外接或内接圆之间的间隙中的分子模式遵循数学预测，它们的尺寸可以通过改变邮票结构尺寸来调整，包括高度,螺距,和形状。这些产生的表面分子图案可以用作生物识别阵列或转移到下面的Au层用于金属结构产生。通过将CLL过程与这种间隙现象相结合，以前被认为是缺点的软材料属性可以用来在简单的草图中实现低于10nm的特征。
