Abstract：
A direct comparison between electron transparent transmission electron microscope (TEM) samples prepared with gallium (Ga) and xenon (Xe) focused ion beams (FIBs) is performed to determine if equivalent quality samples can be prepared with both ion species. We prepared samples using Ga FIB and Xe plasma focused ion beam (PFIB) while altering a variety of different deposition and milling parameters. The samples’ final thicknesses were evaluated using STEM-EELS t/λ data. Using the Ga FIB sample as a standard, we compared the Xe PFIB samples to the standard and to each other. We show that although the Xe PFIB sample preparation technique is quite different from the Ga FIB technique, it is possible to produce high-quality, large area TEM samples with Xe PFIB. We also describe best practices for a Xe PFIB TEM sample preparation workflow to enable consistent success for any thoughtful FIB operator. For Xe PFIB, we show that a decision must be made between the ultimate sample thickness and the size of the electron transparent region.
摘要：
在用镓(Ga)和氙(Xe)聚焦离子束(FIB)制备的电子透明透射电子显微镜(TEM)样品之间进行直接比较,以确定是否可以用两种离子种类制备同等质量的样品。我们使用GaFIB和Xe等离子体聚焦离子束（PFIB）制备样品，同时改变各种不同的沉积和铣削参数。使用STEM-EELSt/λ数据评估样品的最终厚度。使用GaFIB样品作为标准，我们将XePFIB样品与标准品和彼此进行了比较。我们表明，尽管XePFIB样品制备技术与GaFIB技术有很大不同，有可能生产高质量的，具有XePFIB的大面积TEM样品。我们还描述了XePFIBTEM样品制备工作流程的最佳实践，以使任何周到的FIB操作员都能获得一致的成功。对于XePFIB，我们表明，必须在最终样品厚度和电子透明区域的尺寸之间做出决定。
