PDF(Sci-hub)
Abstract：
We show that an atomic force microscope (AFM) tip-based dynamic plowing lithography (DPL) approach can be used to fabricate nanoscale pits with high throughput. The method relies on scratching with a relatively large speed over a sample surface in tapping mode, which is responsible for the separation distance of adjacent pits. Scratching tests are carried out on a poly(methyl methacrylate) (PMMA) thin film using a diamond-like carbon coating tip. Results show that 100 μm/s is the critical value of the scratching speed. When the scratching speed is greater than 100 μm/s, pit structures can be generated. In contrast, nanogrooves can be formed with speeds less than the critical value. Because of the difficulty of breaking the molecular chain of glass-state polymer with an applied high-frequency load and low-energy dissipation in one interaction of the tip and the sample, one pit requires 65-80 penetrations to be achieved. Subsequently, the forming process of the pit is analyzed in detail, including three phases: elastic deformation, plastic deformation, and climbing over the pile-up. In particular, 4800-5800 pits can be obtained in 1 s using this proposed method. Both experiments and theoretical analysis are presented that fully determine the potential of this proposed method to fabricate pits efficiently.
摘要：
我们表明，原子力显微镜（AFM）基于尖端的动态耕作光刻（DPL）方法可用于制造具有高吞吐量的纳米级凹坑。该方法依赖于在轻敲模式下以相对较大的速度在样品表面上刮擦。这是负责相邻凹坑的分离距离。使用类金刚石碳涂层尖端在聚（甲基丙烯酸甲酯）（PMMA）薄膜上进行刮擦测试。结果表明，100μm/s是划痕速度的临界值。当划痕速度大于100μm/s时,可以生成凹坑结构。相比之下,可以以小于临界值的速度形成纳米槽。由于在尖端和样品的一次相互作用中，施加高频载荷和低能量耗散难以破坏玻璃态聚合物的分子链，一个坑需要实现65-80个穿透。随后，详细分析了基坑的形成过程，包括三个阶段：弹性变形，塑性变形,爬过堆积物。特别是,使用该方法可以在1s内获得4800-5800个凹坑。实验和理论分析都充分确定了该方法有效制造凹坑的潜力。
